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Olefin metathesis catalyst .III. Angle-resolved XPS and depth profiling study of a tungsten oxide layer on silica.

Francis Verpoort UGent, AR BOSSUYT and Ludo Verdonck (1996) JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA. 82(3). p.151-163
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
journal title
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
J. Electron Spectrosc. Relat. Phenom.
volume
82
issue
3
pages
151-163 pages
Web of Science type
Article
ISSN
0368-2048
language
English
UGent publication?
yes
classification
A1
id
181825
handle
http://hdl.handle.net/1854/LU-181825
date created
2004-01-14 13:41:00
date last changed
2018-01-29 12:12:58
@article{181825,
  author       = {Verpoort, Francis and BOSSUYT, AR and Verdonck, Ludo},
  issn         = {0368-2048},
  journal      = {JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA},
  language     = {eng},
  number       = {3},
  pages        = {151--163},
  title        = {Olefin metathesis catalyst .III. Angle-resolved XPS and depth profiling study of a tungsten oxide layer on silica.},
  volume       = {82},
  year         = {1996},
}

Chicago
Verpoort, Francis, AR BOSSUYT, and Ludo Verdonck. 1996. “Olefin Metathesis Catalyst .III. Angle-resolved XPS and Depth Profiling Study of a Tungsten Oxide Layer on Silica.” Journal of Electron Spectroscopy and Related Phenomena 82 (3): 151–163.
APA
Verpoort, F., BOSSUYT, A., & Verdonck, L. (1996). Olefin metathesis catalyst .III. Angle-resolved XPS and depth profiling study of a tungsten oxide layer on silica. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 82(3), 151–163.
Vancouver
1.
Verpoort F, BOSSUYT A, Verdonck L. Olefin metathesis catalyst .III. Angle-resolved XPS and depth profiling study of a tungsten oxide layer on silica. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA. 1996;82(3):151–63.
MLA
Verpoort, Francis, AR BOSSUYT, and Ludo Verdonck. “Olefin Metathesis Catalyst .III. Angle-resolved XPS and Depth Profiling Study of a Tungsten Oxide Layer on Silica.” JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA 82.3 (1996): 151–163. Print.