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Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography.

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Chicago
Bogaerts, Wim, V WIAUX, Dirk Taillaert, S BECKX, Bert Luyssaert, Peter Bienstman, and Roel Baets. 2002. “Fabrication of Photonic Crystals in Silicon-on-insulator Using 248-nm Deep UV Lithography.” Ieee Journal of Selected Topics in Quantum Electronics 8 (4): 928–934.
APA
Bogaerts, Wim, WIAUX, V., Taillaert, D., BECKX, S., Luyssaert, B., Bienstman, P., & Baets, R. (2002). Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography. IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 8(4), 928–934.
Vancouver
1.
Bogaerts W, WIAUX V, Taillaert D, BECKX S, Luyssaert B, Bienstman P, et al. Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography. IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS. 2002;8(4):928–34.
MLA
Bogaerts, Wim, V WIAUX, Dirk Taillaert, et al. “Fabrication of Photonic Crystals in Silicon-on-insulator Using 248-nm Deep UV Lithography.” IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS 8.4 (2002): 928–934. Print.
@article{166632,
  author       = {Bogaerts, Wim and WIAUX, V and Taillaert, Dirk and BECKX, S and Luyssaert, Bert and Bienstman, Peter and Baets, Roel},
  issn         = {1077-260X},
  journal      = {IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS},
  language     = {eng},
  number       = {4},
  pages        = {928--934},
  title        = {Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography.},
  volume       = {8},
  year         = {2002},
}

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