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CoSi2 formation using a Ti capping layer-Influence of processing conditions on CoSi2 nucleation

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Chicago
Detavernier, Christophe, Roland Vanmeirhaeghe, and K MAEX. 2002. “CoSi2 Formation Using a Ti Capping layer-Influence of Processing Conditions on CoSi2 Nucleation.” In MRS Proc. 670 (Spring Meeting San Francisco 2001), Materials Research Society, Pittsburgh, PA, USA, 2002, K 7.4.1-7.4.6.
APA
Detavernier, C., Vanmeirhaeghe, R., & MAEX, K. (2002). CoSi2 formation using a Ti capping layer-Influence of processing conditions on CoSi2 nucleation. MRS Proc. 670 (Spring Meeting San Francisco 2001), Materials Research Society, Pittsburgh, PA, USA, 2002, K 7.4.1-7.4.6.
Vancouver
1.
Detavernier C, Vanmeirhaeghe R, MAEX K. CoSi2 formation using a Ti capping layer-Influence of processing conditions on CoSi2 nucleation. MRS Proc. 670 (Spring Meeting San Francisco 2001), Materials Research Society, Pittsburgh, PA, USA, 2002, K 7.4.1-7.4.6. 2002.
MLA
Detavernier, Christophe, Roland Vanmeirhaeghe, and K MAEX. “CoSi2 Formation Using a Ti Capping layer-Influence of Processing Conditions on CoSi2 Nucleation.” MRS Proc. 670 (Spring Meeting San Francisco 2001), Materials Research Society, Pittsburgh, PA, USA, 2002, K 7.4.1-7.4.6. 2002. Print.
@inproceedings{162200,
  author       = {Detavernier, Christophe and Vanmeirhaeghe, Roland and MAEX, K},
  booktitle    = {MRS Proc. 670 (Spring Meeting San Francisco 2001), Materials Research Society, Pittsburgh, PA, USA, 2002, K 7.4.1-7.4.6},
  language     = {eng},
  title        = {CoSi2 formation using a Ti capping layer-Influence of processing conditions on CoSi2 nucleation},
  year         = {2002},
}