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Poisoning during sputtering of an Al-target in a mixture of Ar and O2.

Roger De Gryse UGent, Diederik Depla UGent and Johan Haemers UGent (2002) VACUUM TECHNOLOGY AND COATING. p.24-31
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle
publication status
published
subject
journal title
VACUUM TECHNOLOGY AND COATING
pages
24-31 pages
ISSN
1528-350X
language
English
UGent publication?
yes
classification
A2
id
162166
handle
http://hdl.handle.net/1854/LU-162166
date created
2004-01-14 13:39:00
date last changed
2016-12-19 15:38:58
@article{162166,
  author       = {De Gryse, Roger and Depla, Diederik and Haemers, Johan},
  issn         = {1528-350X},
  journal      = {VACUUM TECHNOLOGY AND COATING},
  language     = {eng},
  pages        = {24--31},
  title        = {Poisoning during sputtering of an Al-target in a mixture of Ar and O2.},
  year         = {2002},
}

Chicago
De Gryse, Roger, Diederik Depla, and Johan Haemers. 2002. “Poisoning During Sputtering of an Al-target in a Mixture of Ar and O2.” Vacuum Technology and Coating: 24–31.
APA
De Gryse, R., Depla, D., & Haemers, J. (2002). Poisoning during sputtering of an Al-target in a mixture of Ar and O2. VACUUM TECHNOLOGY AND COATING, 24–31.
Vancouver
1.
De Gryse R, Depla D, Haemers J. Poisoning during sputtering of an Al-target in a mixture of Ar and O2. VACUUM TECHNOLOGY AND COATING. 2002;24–31.
MLA
De Gryse, Roger, Diederik Depla, and Johan Haemers. “Poisoning During Sputtering of an Al-target in a Mixture of Ar and O2.” VACUUM TECHNOLOGY AND COATING (2002): 24–31. Print.