Advanced search

Influence of recapture of secondary electrons on the magnetron sputtering deposition process.

Guy Buyle, Diederik Depla (UGent) , Karin Eufinger (UGent) , Johan Haemers (UGent) and Roger De Gryse (UGent)
Author
Organization

Citation

Please use this url to cite or link to this publication:

Chicago
Buyle, Guy, Diederik Depla, Karin Eufinger, Johan Haemers, and Roger De Gryse. 2002. “Influence of Recapture of Secondary Electrons on the Magnetron Sputtering Deposition Process.” In 45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002., 348–353.
APA
Buyle, G., Depla, D., Eufinger, K., Haemers, J., & De Gryse, R. (2002). Influence of recapture of secondary electrons on the magnetron sputtering deposition process. 45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002. (pp. 348–353).
Vancouver
1.
Buyle G, Depla D, Eufinger K, Haemers J, De Gryse R. Influence of recapture of secondary electrons on the magnetron sputtering deposition process. 45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002. 2002. p. 348–53.
MLA
Buyle, Guy, Diederik Depla, Karin Eufinger, et al. “Influence of Recapture of Secondary Electrons on the Magnetron Sputtering Deposition Process.” 45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002. 2002. 348–353. Print.
@inproceedings{162159,
  author       = {Buyle, Guy and Depla, Diederik and Eufinger, Karin and Haemers, Johan and De Gryse, Roger},
  booktitle    = {45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002.},
  language     = {eng},
  pages        = {348--353},
  title        = {Influence of recapture of secondary electrons on the magnetron sputtering deposition process.},
  year         = {2002},
}