Influence of recapture of secondary electrons on the magnetron sputtering deposition process.
- Author
- Guy Buyle, Diederik Depla (UGent) , Karin Eufinger (UGent) , Johan Haemers (UGent) and Roger De Gryse (UGent)
- Organization
Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-162159
- MLA
- Buyle, Guy, et al. “Influence of Recapture of Secondary Electrons on the Magnetron Sputtering Deposition Process.” 45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002., 2002, pp. 348–53.
- APA
- Buyle, G., Depla, D., Eufinger, K., Haemers, J., & De Gryse, R. (2002). Influence of recapture of secondary electrons on the magnetron sputtering deposition process. 45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002., 348–353.
- Chicago author-date
- Buyle, Guy, Diederik Depla, Karin Eufinger, Johan Haemers, and Roger De Gryse. 2002. “Influence of Recapture of Secondary Electrons on the Magnetron Sputtering Deposition Process.” In 45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002., 348–53.
- Chicago author-date (all authors)
- Buyle, Guy, Diederik Depla, Karin Eufinger, Johan Haemers, and Roger De Gryse. 2002. “Influence of Recapture of Secondary Electrons on the Magnetron Sputtering Deposition Process.” In 45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002., 348–353.
- Vancouver
- 1.Buyle G, Depla D, Eufinger K, Haemers J, De Gryse R. Influence of recapture of secondary electrons on the magnetron sputtering deposition process. In: 45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002. 2002. p. 348–53.
- IEEE
- [1]G. Buyle, D. Depla, K. Eufinger, J. Haemers, and R. De Gryse, “Influence of recapture of secondary electrons on the magnetron sputtering deposition process.,” in 45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002., 2002, pp. 348–353.
@inproceedings{162159,
author = {{Buyle, Guy and Depla, Diederik and Eufinger, Karin and Haemers, Johan and De Gryse, Roger}},
booktitle = {{45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002.}},
language = {{eng}},
pages = {{348--353}},
title = {{Influence of recapture of secondary electrons on the magnetron sputtering deposition process.}},
year = {{2002}},
}