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MLA
DE BOSSCHER, W., et al. “Uniformity Control in Sputter Deposition Processes.” 45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002., 2002, pp. 135–41.
APA
DE BOSSCHER, W., Blondeel, A., & Buyle, G. (2002). Uniformity Control in Sputter Deposition Processes. In 45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002. (pp. 135–141).
Chicago author-date
DE BOSSCHER, W, Anja Blondeel, and Guy Buyle. 2002. “Uniformity Control in Sputter Deposition Processes.” In 45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002., 135–41.
Chicago author-date (all authors)
DE BOSSCHER, W, Anja Blondeel, and Guy Buyle. 2002. “Uniformity Control in Sputter Deposition Processes.” In 45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002., 135–141.
Vancouver
1.
DE BOSSCHER W, Blondeel A, Buyle G. Uniformity Control in Sputter Deposition Processes. In: 45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002. 2002. p. 135–41.
IEEE
[1]
W. DE BOSSCHER, A. Blondeel, and G. Buyle, “Uniformity Control in Sputter Deposition Processes.,” in 45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002., 2002, pp. 135–141.
@inproceedings{162152,
  author       = {{DE BOSSCHER, W and Blondeel, Anja and Buyle, Guy}},
  booktitle    = {{45th Annual Technical Conference Proceedings, Society of Vacuum Coaters, Albuquerque (NM-USA) 2002.}},
  language     = {{eng}},
  pages        = {{135--141}},
  title        = {{Uniformity Control in Sputter Deposition Processes.}},
  year         = {{2002}},
}