Target voltage behaviour during DC sputtering of silicon in an argon/nitrogen mixture.
- Author
- Diederik Depla (UGent) , A COLPAERT, Karin Eufinger (UGent) , Anneke Segers, Johan Haemers (UGent) and Roger De Gryse (UGent)
- Organization
Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-162118
- MLA
- Depla, Diederik, et al. “Target Voltage Behaviour during DC Sputtering of Silicon in an Argon/Nitrogen Mixture.” VACUUM, vol. 66, no. 1, 2002, pp. 9–17.
- APA
- Depla, D., COLPAERT, A., Eufinger, K., Segers, A., Haemers, J., & De Gryse, R. (2002). Target voltage behaviour during DC sputtering of silicon in an argon/nitrogen mixture. VACUUM, 66(1), 9–17.
- Chicago author-date
- Depla, Diederik, A COLPAERT, Karin Eufinger, Anneke Segers, Johan Haemers, and Roger De Gryse. 2002. “Target Voltage Behaviour during DC Sputtering of Silicon in an Argon/Nitrogen Mixture.” VACUUM 66 (1): 9–17.
- Chicago author-date (all authors)
- Depla, Diederik, A COLPAERT, Karin Eufinger, Anneke Segers, Johan Haemers, and Roger De Gryse. 2002. “Target Voltage Behaviour during DC Sputtering of Silicon in an Argon/Nitrogen Mixture.” VACUUM 66 (1): 9–17.
- Vancouver
- 1.Depla D, COLPAERT A, Eufinger K, Segers A, Haemers J, De Gryse R. Target voltage behaviour during DC sputtering of silicon in an argon/nitrogen mixture. VACUUM. 2002;66(1):9–17.
- IEEE
- [1]D. Depla, A. COLPAERT, K. Eufinger, A. Segers, J. Haemers, and R. De Gryse, “Target voltage behaviour during DC sputtering of silicon in an argon/nitrogen mixture.,” VACUUM, vol. 66, no. 1, pp. 9–17, 2002.
@article{162118,
author = {{Depla, Diederik and COLPAERT, A and Eufinger, Karin and Segers, Anneke and Haemers, Johan and De Gryse, Roger}},
issn = {{0042-207X}},
journal = {{VACUUM}},
language = {{eng}},
number = {{1}},
pages = {{9--17}},
title = {{Target voltage behaviour during DC sputtering of silicon in an argon/nitrogen mixture.}},
volume = {{66}},
year = {{2002}},
}