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Formation of epitaxial CoSi2 by a Cr or Mo interlayer: Comparison with a Ti interlayer.

Christophe Detavernier UGent, Roland Vanmeirhaeghe, Felix Cardon, K MAEX, H BENDER, B BRIJS and W VANDERVORST (2001) JOURNAL OF APPLIED PHYSICS. 89(4). p.2146-2150
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
journal title
JOURNAL OF APPLIED PHYSICS
J. Appl. Phys.
volume
89
issue
4
pages
2146-2150 pages
Web of Science type
Article
Web of Science id
000166688300023
JCR category
PHYSICS, APPLIED
JCR impact factor
2.128 (2001)
JCR rank
4/70 (2001)
JCR quartile
1 (2001)
ISSN
0021-8979
language
English
UGent publication?
yes
classification
A1
id
137568
handle
http://hdl.handle.net/1854/LU-137568
date created
2004-01-14 13:37:00
date last changed
2016-12-19 15:39:07
@article{137568,
  author       = {Detavernier, Christophe and Vanmeirhaeghe, Roland and Cardon, Felix and MAEX, K and BENDER, H and BRIJS, B and VANDERVORST, W},
  issn         = {0021-8979},
  journal      = {JOURNAL OF APPLIED PHYSICS},
  language     = {eng},
  number       = {4},
  pages        = {2146--2150},
  title        = {Formation of epitaxial CoSi2 by a Cr or Mo interlayer: Comparison with a Ti interlayer.},
  volume       = {89},
  year         = {2001},
}

Chicago
Detavernier, Christophe, Roland Vanmeirhaeghe, Felix Cardon, K MAEX, H BENDER, B BRIJS, and W VANDERVORST. 2001. “Formation of Epitaxial CoSi2 by a Cr or Mo Interlayer: Comparison with a Ti Interlayer.” Journal of Applied Physics 89 (4): 2146–2150.
APA
Detavernier, C., Vanmeirhaeghe, R., Cardon, F., MAEX, K., BENDER, H., BRIJS, B., & VANDERVORST, W. (2001). Formation of epitaxial CoSi2 by a Cr or Mo interlayer: Comparison with a Ti interlayer. JOURNAL OF APPLIED PHYSICS, 89(4), 2146–2150.
Vancouver
1.
Detavernier C, Vanmeirhaeghe R, Cardon F, MAEX K, BENDER H, BRIJS B, et al. Formation of epitaxial CoSi2 by a Cr or Mo interlayer: Comparison with a Ti interlayer. JOURNAL OF APPLIED PHYSICS. 2001;89(4):2146–50.
MLA
Detavernier, Christophe, Roland Vanmeirhaeghe, Felix Cardon, et al. “Formation of Epitaxial CoSi2 by a Cr or Mo Interlayer: Comparison with a Ti Interlayer.” JOURNAL OF APPLIED PHYSICS 89.4 (2001): 2146–2150. Print.