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Extension of a multilayer interconnection technology in MCM-Si with opto-electronic facilities.

(2000) MICROELECTRONICS RELIABILITY. 40(1). p.163-170
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Chicago
De Pauw, Herbert, Herbert De Smet, Jan Vanfleteren, Jo Lernout, and André Van Calster. 2000. “Extension of a Multilayer Interconnection Technology in MCM-Si with Opto-electronic Facilities.” Microelectronics Reliability 40 (1): 163–170.
APA
De Pauw, H., De Smet, H., Vanfleteren, J., Lernout, J., & Van Calster, A. (2000). Extension of a multilayer interconnection technology in MCM-Si with opto-electronic facilities. MICROELECTRONICS RELIABILITY, 40(1), 163–170.
Vancouver
1.
De Pauw H, De Smet H, Vanfleteren J, Lernout J, Van Calster A. Extension of a multilayer interconnection technology in MCM-Si with opto-electronic facilities. MICROELECTRONICS RELIABILITY. 2000;40(1):163–70.
MLA
De Pauw, Herbert, Herbert De Smet, Jan Vanfleteren, et al. “Extension of a Multilayer Interconnection Technology in MCM-Si with Opto-electronic Facilities.” MICROELECTRONICS RELIABILITY 40.1 (2000): 163–170. Print.
@article{129659,
  author       = {De Pauw, Herbert and De Smet, Herbert and Vanfleteren, Jan and Lernout, Jo and Van Calster, Andr{\'e}},
  issn         = {0026-2714},
  journal      = {MICROELECTRONICS RELIABILITY},
  language     = {eng},
  number       = {1},
  pages        = {163--170},
  title        = {Extension of a multilayer interconnection technology in MCM-Si with opto-electronic facilities.},
  volume       = {40},
  year         = {2000},
}

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