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Application of a mechanistic UV/hydrogen peroxide model at full-scale: sensitivity analysis, calibration and performance evaluation

Wim Audenaert, Yoshi Vermeersch, Stijn Van Hulle UGent, Pascal Dejans UGent, Ann Dumoulin UGent and Ingmar Nopens UGent (2011) CHEMICAL ENGINEERING JOURNAL. 171(1). p.113-126
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
UV/H2O2, Advanced oxidation processes, Model calibration, Sensitivity analysis, UV absorption, NOM, ADVANCED OXIDATION PROCESSES, TERT-BUTYL ETHER, HYDROGEN-PEROXIDE, UV/H2O2 PROCESS, KINETIC-MODEL, OZONE DECOMPOSITION, AQUEOUS-SOLUTIONS, PRODUCT FORMATION, ORGANIC-MATTER, DRINKING-WATER
journal title
CHEMICAL ENGINEERING JOURNAL
Chem. Eng. J.
volume
171
issue
1
pages
113 - 126
Web of Science type
Article
Web of Science id
000292075000013
JCR category
ENGINEERING, CHEMICAL
JCR impact factor
3.461 (2011)
JCR rank
11/132 (2011)
JCR quartile
1 (2011)
ISSN
1385-8947
DOI
10.1016/j.cej.2011.03.071
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
1260447
handle
http://hdl.handle.net/1854/LU-1260447
date created
2011-06-10 16:28:00
date last changed
2016-12-19 15:38:09
@article{1260447,
  author       = {Audenaert, Wim and Vermeersch, Yoshi and Van Hulle, Stijn and Dejans, Pascal and Dumoulin, Ann and Nopens, Ingmar},
  issn         = {1385-8947},
  journal      = {CHEMICAL ENGINEERING JOURNAL},
  keyword      = {UV/H2O2,Advanced oxidation processes,Model calibration,Sensitivity analysis,UV absorption,NOM,ADVANCED OXIDATION PROCESSES,TERT-BUTYL ETHER,HYDROGEN-PEROXIDE,UV/H2O2 PROCESS,KINETIC-MODEL,OZONE DECOMPOSITION,AQUEOUS-SOLUTIONS,PRODUCT FORMATION,ORGANIC-MATTER,DRINKING-WATER},
  language     = {eng},
  number       = {1},
  pages        = {113--126},
  title        = {Application of a mechanistic UV/hydrogen peroxide model at full-scale: sensitivity analysis, calibration and performance evaluation},
  url          = {http://dx.doi.org/10.1016/j.cej.2011.03.071},
  volume       = {171},
  year         = {2011},
}

Chicago
Audenaert, Wim, Yoshi Vermeersch, Stijn Van Hulle, Pascal Dejans, Ann Dumoulin, and Ingmar Nopens. 2011. “Application of a Mechanistic UV/hydrogen Peroxide Model at Full-scale: Sensitivity Analysis, Calibration and Performance Evaluation.” Chemical Engineering Journal 171 (1): 113–126.
APA
Audenaert, W., Vermeersch, Y., Van Hulle, S., Dejans, P., Dumoulin, A., & Nopens, I. (2011). Application of a mechanistic UV/hydrogen peroxide model at full-scale: sensitivity analysis, calibration and performance evaluation. CHEMICAL ENGINEERING JOURNAL, 171(1), 113–126.
Vancouver
1.
Audenaert W, Vermeersch Y, Van Hulle S, Dejans P, Dumoulin A, Nopens I. Application of a mechanistic UV/hydrogen peroxide model at full-scale: sensitivity analysis, calibration and performance evaluation. CHEMICAL ENGINEERING JOURNAL. 2011;171(1):113–26.
MLA
Audenaert, Wim, Yoshi Vermeersch, Stijn Van Hulle, et al. “Application of a Mechanistic UV/hydrogen Peroxide Model at Full-scale: Sensitivity Analysis, Calibration and Performance Evaluation.” CHEMICAL ENGINEERING JOURNAL 171.1 (2011): 113–126. Print.