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Application of a mechanistic UV/hydrogen peroxide model at full-scale: sensitivity analysis, calibration and performance evaluation

Wim Audenaert UGent, Yoshi Vermeersch, Stijn Van Hulle UGent, Pascal Dejans UGent, Ann Dumoulin UGent and Ingmar Nopens UGent (2011) CHEMICAL ENGINEERING JOURNAL. 171(1). p.113-126
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
UV/H2O2, Advanced oxidation processes, Model calibration, Sensitivity analysis, UV absorption, NOM, ADVANCED OXIDATION PROCESSES, TERT-BUTYL ETHER, HYDROGEN-PEROXIDE, UV/H2O2 PROCESS, KINETIC-MODEL, OZONE DECOMPOSITION, AQUEOUS-SOLUTIONS, PRODUCT FORMATION, ORGANIC-MATTER, DRINKING-WATER
journal title
CHEMICAL ENGINEERING JOURNAL
Chem. Eng. J.
volume
171
issue
1
pages
113 - 126
Web of Science type
Article
Web of Science id
000292075000013
JCR category
ENGINEERING, CHEMICAL
JCR impact factor
3.461 (2011)
JCR rank
11/132 (2011)
JCR quartile
1 (2011)
ISSN
1385-8947
DOI
10.1016/j.cej.2011.03.071
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
1260447
handle
http://hdl.handle.net/1854/LU-1260447
date created
2011-06-10 16:28:00
date last changed
2012-05-02 13:51:26
@article{1260447,
  author       = {Audenaert, Wim and Vermeersch, Yoshi and Van Hulle, Stijn and Dejans, Pascal and Dumoulin, Ann and Nopens, Ingmar},
  issn         = {1385-8947},
  journal      = {CHEMICAL ENGINEERING JOURNAL},
  keyword      = {UV/H2O2,Advanced oxidation processes,Model calibration,Sensitivity analysis,UV absorption,NOM,ADVANCED OXIDATION PROCESSES,TERT-BUTYL ETHER,HYDROGEN-PEROXIDE,UV/H2O2 PROCESS,KINETIC-MODEL,OZONE DECOMPOSITION,AQUEOUS-SOLUTIONS,PRODUCT FORMATION,ORGANIC-MATTER,DRINKING-WATER},
  language     = {eng},
  number       = {1},
  pages        = {113--126},
  title        = {Application of a mechanistic UV/hydrogen peroxide model at full-scale: sensitivity analysis, calibration and performance evaluation},
  url          = {http://dx.doi.org/10.1016/j.cej.2011.03.071},
  volume       = {171},
  year         = {2011},
}

Chicago
Audenaert, Wim, Yoshi Vermeersch, Stijn Van Hulle, Pascal Dejans, Ann Dumoulin, and Ingmar Nopens. 2011. “Application of a Mechanistic UV/hydrogen Peroxide Model at Full-scale: Sensitivity Analysis, Calibration and Performance Evaluation.” Chemical Engineering Journal 171 (1): 113–126.
APA
Audenaert, W., Vermeersch, Y., Van Hulle, S., Dejans, P., Dumoulin, A., & Nopens, I. (2011). Application of a mechanistic UV/hydrogen peroxide model at full-scale: sensitivity analysis, calibration and performance evaluation. CHEMICAL ENGINEERING JOURNAL, 171(1), 113–126.
Vancouver
1.
Audenaert W, Vermeersch Y, Van Hulle S, Dejans P, Dumoulin A, Nopens I. Application of a mechanistic UV/hydrogen peroxide model at full-scale: sensitivity analysis, calibration and performance evaluation. CHEMICAL ENGINEERING JOURNAL. 2011;171(1):113–26.
MLA
Audenaert, Wim, Yoshi Vermeersch, Stijn Van Hulle, et al. “Application of a Mechanistic UV/hydrogen Peroxide Model at Full-scale: Sensitivity Analysis, Calibration and Performance Evaluation.” CHEMICAL ENGINEERING JOURNAL 171.1 (2011): 113–126. Print.