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Conformality of thermal and plasma enhanced ALD

Jolien Dendooven UGent, Jan Musschoot UGent, Davy Deduytsche UGent, Roland Vanmeirhaeghe and Christophe Detavernier UGent (2008) Atomic Layer Deposition, 8th International conference, Abstracts.
Please use this url to cite or link to this publication:
author
organization
year
type
conference
publication status
published
subject
in
Atomic Layer Deposition, 8th International conference, Abstracts
conference name
8th International conference on Atomic Layer Deposition
conference location
Bruges, Belgium
conference start
2008-06-29
conference end
2008-07-02
language
English
UGent publication?
yes
classification
C3
copyright statement
I have transferred the copyright for this publication to the publisher
id
1245439
handle
http://hdl.handle.net/1854/LU-1245439
date created
2011-05-27 12:38:04
date last changed
2016-12-19 15:35:21
@inproceedings{1245439,
  author       = {Dendooven, Jolien and Musschoot, Jan and Deduytsche, Davy and Vanmeirhaeghe, Roland and Detavernier, Christophe},
  booktitle    = {Atomic Layer Deposition, 8th International conference, Abstracts},
  language     = {eng},
  location     = {Bruges, Belgium},
  title        = {Conformality of thermal and plasma enhanced ALD},
  year         = {2008},
}

Chicago
Dendooven, Jolien, Jan Musschoot, Davy Deduytsche, Roland Vanmeirhaeghe, and Christophe Detavernier. 2008. “Conformality of Thermal and Plasma Enhanced ALD.” In Atomic Layer Deposition, 8th International Conference, Abstracts.
APA
Dendooven, J., Musschoot, J., Deduytsche, D., Vanmeirhaeghe, R., & Detavernier, C. (2008). Conformality of thermal and plasma enhanced ALD. Atomic Layer Deposition, 8th International conference, Abstracts. Presented at the 8th International conference on Atomic Layer Deposition.
Vancouver
1.
Dendooven J, Musschoot J, Deduytsche D, Vanmeirhaeghe R, Detavernier C. Conformality of thermal and plasma enhanced ALD. Atomic Layer Deposition, 8th International conference, Abstracts. 2008.
MLA
Dendooven, Jolien, Jan Musschoot, Davy Deduytsche, et al. “Conformality of Thermal and Plasma Enhanced ALD.” Atomic Layer Deposition, 8th International Conference, Abstracts. 2008. Print.