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Conformality of thermal and plasma enhanced ALD

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Chicago
Dendooven, Jolien, Jan Musschoot, Davy Deduytsche, Roland Vanmeirhaeghe, and Christophe Detavernier. 2008. “Conformality of Thermal and Plasma Enhanced ALD.” In Atomic Layer Deposition, 8th International Conference, Abstracts.
APA
Dendooven, J., Musschoot, J., Deduytsche, D., Vanmeirhaeghe, R., & Detavernier, C. (2008). Conformality of thermal and plasma enhanced ALD. Atomic Layer Deposition, 8th International conference, Abstracts. Presented at the 8th International conference on Atomic Layer Deposition.
Vancouver
1.
Dendooven J, Musschoot J, Deduytsche D, Vanmeirhaeghe R, Detavernier C. Conformality of thermal and plasma enhanced ALD. Atomic Layer Deposition, 8th International conference, Abstracts. 2008.
MLA
Dendooven, Jolien, Jan Musschoot, Davy Deduytsche, et al. “Conformality of Thermal and Plasma Enhanced ALD.” Atomic Layer Deposition, 8th International Conference, Abstracts. 2008. Print.
@inproceedings{1245439,
  author       = {Dendooven, Jolien and Musschoot, Jan and Deduytsche, Davy and Vanmeirhaeghe, Roland and Detavernier, Christophe},
  booktitle    = {Atomic Layer Deposition, 8th International conference, Abstracts},
  language     = {eng},
  location     = {Bruges, Belgium},
  title        = {Conformality of thermal and plasma enhanced ALD},
  year         = {2008},
}