Advanced search
1 file | 36.47 KB

Modeling the conformality of atomic layer deposition: the effect of sticking probability

Author
Organization

Downloads

  • JDendooven.pdf
    • full text
    • |
    • open access
    • |
    • PDF
    • |
    • 36.47 KB

Citation

Please use this url to cite or link to this publication:

Chicago
Dendooven, Jolien, Jan Musschoot, Davy Deduytsche, Roland Vanmeirhaeghe, and Christophe Detavernier. 2009. “Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability.” In Atomic Layer Deposition, 9th Baltic Conference. Uppsala, Sweden: Uppsala University. Ångström Laboratory.
APA
Dendooven, J., Musschoot, J., Deduytsche, D., Vanmeirhaeghe, R., & Detavernier, C. (2009). Modeling the conformality of atomic layer deposition: the effect of sticking probability. Atomic Layer Deposition, 9th Baltic conference. Presented at the 9th Baltic conference on Atomic Layer Deposition, Uppsala, Sweden: Uppsala University. Ångström Laboratory.
Vancouver
1.
Dendooven J, Musschoot J, Deduytsche D, Vanmeirhaeghe R, Detavernier C. Modeling the conformality of atomic layer deposition: the effect of sticking probability. Atomic Layer Deposition, 9th Baltic conference. Uppsala, Sweden: Uppsala University. Ångström Laboratory; 2009.
MLA
Dendooven, Jolien, Jan Musschoot, Davy Deduytsche, et al. “Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability.” Atomic Layer Deposition, 9th Baltic Conference. Uppsala, Sweden: Uppsala University. Ångström Laboratory, 2009. Print.
@inproceedings{1245426,
  author       = {Dendooven, Jolien and Musschoot, Jan and Deduytsche, Davy and Vanmeirhaeghe, Roland and Detavernier, Christophe},
  booktitle    = {Atomic Layer Deposition, 9th Baltic conference},
  language     = {eng},
  location     = {Uppsala, Sweden},
  publisher    = {Uppsala University. {\AA}ngstr{\"o}m Laboratory},
  title        = {Modeling the conformality of atomic layer deposition: the effect of sticking probability},
  year         = {2009},
}