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Modeling the conformality of atomic layer deposition: the effect of sticking probability

Jolien Dendooven UGent, Jan Musschoot UGent, Davy Deduytsche UGent, Roland Vanmeirhaeghe and Christophe Detavernier UGent (2009) Atomic Layer Deposition, 9th Baltic conference.
Please use this url to cite or link to this publication:
author
organization
year
type
conference
publication status
published
subject
in
Atomic Layer Deposition, 9th Baltic conference
publisher
Uppsala University. Ångström Laboratory
place of publication
Uppsala, Sweden
conference name
9th Baltic conference on Atomic Layer Deposition
conference location
Uppsala, Sweden
conference start
2009-06-15
conference end
2009-06-16
language
English
UGent publication?
yes
classification
C3
copyright statement
I have transferred the copyright for this publication to the publisher
id
1245426
handle
http://hdl.handle.net/1854/LU-1245426
date created
2011-05-27 12:33:43
date last changed
2017-01-02 09:53:00
@inproceedings{1245426,
  author       = {Dendooven, Jolien and Musschoot, Jan and Deduytsche, Davy and Vanmeirhaeghe, Roland and Detavernier, Christophe},
  booktitle    = {Atomic Layer Deposition, 9th Baltic conference},
  language     = {eng},
  location     = {Uppsala, Sweden},
  publisher    = {Uppsala University. {\AA}ngstr{\"o}m Laboratory},
  title        = {Modeling the conformality of atomic layer deposition: the effect of sticking probability},
  year         = {2009},
}

Chicago
Dendooven, Jolien, Jan Musschoot, Davy Deduytsche, Roland Vanmeirhaeghe, and Christophe Detavernier. 2009. “Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability.” In Atomic Layer Deposition, 9th Baltic Conference. Uppsala, Sweden: Uppsala University. Ångström Laboratory.
APA
Dendooven, J., Musschoot, J., Deduytsche, D., Vanmeirhaeghe, R., & Detavernier, C. (2009). Modeling the conformality of atomic layer deposition: the effect of sticking probability. Atomic Layer Deposition, 9th Baltic conference. Presented at the 9th Baltic conference on Atomic Layer Deposition, Uppsala, Sweden: Uppsala University. Ångström Laboratory.
Vancouver
1.
Dendooven J, Musschoot J, Deduytsche D, Vanmeirhaeghe R, Detavernier C. Modeling the conformality of atomic layer deposition: the effect of sticking probability. Atomic Layer Deposition, 9th Baltic conference. Uppsala, Sweden: Uppsala University. Ångström Laboratory; 2009.
MLA
Dendooven, Jolien, Jan Musschoot, Davy Deduytsche, et al. “Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability.” Atomic Layer Deposition, 9th Baltic Conference. Uppsala, Sweden: Uppsala University. Ångström Laboratory, 2009. Print.