Ghent University Academic Bibliography

Advanced

Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition

Jolien Dendooven UGent, Davy Deduytsche UGent, Jan Musschoot UGent and Christophe Detavernier UGent (2010) Atomic Layer Deposition, 10th International conference, Abstracts.
Please use this url to cite or link to this publication:
author
organization
year
type
conference (meetingAbstract)
publication status
published
subject
in
Atomic Layer Deposition, 10th International conference, Abstracts
conference name
10th International conference on Atomic Layer Deposition
conference location
Seoul, South Korea
conference start
2010-06-20
conference end
2010-06-23
language
English
UGent publication?
yes
classification
C3
copyright statement
I have transferred the copyright for this publication to the publisher
id
1245382
handle
http://hdl.handle.net/1854/LU-1245382
date created
2011-05-27 12:02:52
date last changed
2017-11-30 09:46:07
@inproceedings{1245382,
  author       = {Dendooven, Jolien and Deduytsche, Davy and Musschoot, Jan and Detavernier, Christophe},
  booktitle    = {Atomic Layer Deposition, 10th International conference, Abstracts},
  language     = {eng},
  location     = {Seoul, South Korea},
  title        = {Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition},
  year         = {2010},
}

Chicago
Dendooven, Jolien, Davy Deduytsche, Jan Musschoot, and Christophe Detavernier. 2010. “Conformality of Al2O3 Deposited by Thermal, Plasma-enhanced and Ozone-based Atomic Layer Deposition.” In Atomic Layer Deposition, 10th International Conference, Abstracts.
APA
Dendooven, J., Deduytsche, D., Musschoot, J., & Detavernier, C. (2010). Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition. Atomic Layer Deposition, 10th International conference, Abstracts. Presented at the 10th International conference on Atomic Layer Deposition.
Vancouver
1.
Dendooven J, Deduytsche D, Musschoot J, Detavernier C. Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition. Atomic Layer Deposition, 10th International conference, Abstracts. 2010.
MLA
Dendooven, Jolien, Davy Deduytsche, Jan Musschoot, et al. “Conformality of Al2O3 Deposited by Thermal, Plasma-enhanced and Ozone-based Atomic Layer Deposition.” Atomic Layer Deposition, 10th International Conference, Abstracts. 2010. Print.