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Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition

Jolien Dendooven (UGent) , Davy Deduytsche (UGent) , Jan Musschoot (UGent) and Christophe Detavernier (UGent)
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Chicago
Dendooven, Jolien, Davy Deduytsche, Jan Musschoot, and Christophe Detavernier. 2010. “Conformality of Al2O3 Deposited by Thermal, Plasma-enhanced and Ozone-based Atomic Layer Deposition.” In Atomic Layer Deposition, 10th International Conference, Abstracts.
APA
Dendooven, J., Deduytsche, D., Musschoot, J., & Detavernier, C. (2010). Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition. Atomic Layer Deposition, 10th International conference, Abstracts. Presented at the 10th International conference on Atomic Layer Deposition.
Vancouver
1.
Dendooven J, Deduytsche D, Musschoot J, Detavernier C. Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition. Atomic Layer Deposition, 10th International conference, Abstracts. 2010.
MLA
Dendooven, Jolien, Davy Deduytsche, Jan Musschoot, et al. “Conformality of Al2O3 Deposited by Thermal, Plasma-enhanced and Ozone-based Atomic Layer Deposition.” Atomic Layer Deposition, 10th International Conference, Abstracts. 2010. Print.
@inproceedings{1245382,
  author       = {Dendooven, Jolien and Deduytsche, Davy and Musschoot, Jan and Detavernier, Christophe},
  booktitle    = {Atomic Layer Deposition, 10th International conference, Abstracts},
  language     = {eng},
  location     = {Seoul, South Korea},
  title        = {Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition},
  year         = {2010},
}