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Behavior of electrons in a dual-magnetron sputter deposition system: a Monte Carlo model

M Yusupov, E Bultinck, Diederik Depla UGent and A Bogaerts (2011) NEW JOURNAL OF PHYSICS. 13.
abstract
A Monte Carlo model has been developed for investigating the electron behavior in a dual-magnetron sputter deposition system. To describe the three-dimensional (3D) geometry, different reference frames, i.e. a local and a global coordinate system, were used. In this study, the influence of both closed and mirror magnetic field configurations on the plasma properties is investigated. In the case of a closed magnetic field configuration, the calculated electron trajectories show that if an electron is emitted in (or near) the center of the cathode, where the influence of the magnetic field is low, it is able to travel from one magnetron to the other. On the other hand, when an electron is created at the race track area, it is more or less trapped in the strong magnetic field and cannot easily escape to the second magnetron region. In the case of a mirror magnetic field configuration, irrespective of where the electron is emitted from the cathode, it cannot travel from one magnetron to the other because the magnetic field lines guide the electron to the substrate. Moreover, the electron density and electron impact ionization rate have been calculated and studied in detail for both configurations.
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
PRESSURE, TRANSPORT, SIMULATION, COMBINATORIAL, DISCHARGE, FIELD, EPITAXIAL-GROWTH, UNBALANCED MAGNETRON, THIN-FILMS
journal title
NEW JOURNAL OF PHYSICS
New J. Phys.
volume
13
article number
033018
pages
17 pages
Web of Science type
Article
Web of Science id
000289064600001
JCR category
PHYSICS, MULTIDISCIPLINARY
JCR impact factor
4.177 (2011)
JCR rank
8/82 (2011)
JCR quartile
1 (2011)
ISSN
1367-2630
DOI
10.1088/1367-2630/13/3/033018
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
1235884
handle
http://hdl.handle.net/1854/LU-1235884
date created
2011-05-25 11:18:56
date last changed
2016-12-21 15:42:20
@article{1235884,
  abstract     = {A Monte Carlo model has been developed for investigating the electron behavior in a dual-magnetron sputter deposition system. To describe the three-dimensional (3D) geometry, different reference frames, i.e. a local and a global coordinate system, were used. In this study, the influence of both closed and mirror magnetic field configurations on the plasma properties is investigated. In the case of a closed magnetic field configuration, the calculated electron trajectories show that if an electron is emitted in (or near) the center of the cathode, where the influence of the magnetic field is low, it is able to travel from one magnetron to the other. On the other hand, when an electron is created at the race track area, it is more or less trapped in the strong magnetic field and cannot easily escape to the second magnetron region. In the case of a mirror magnetic field configuration, irrespective of where the electron is emitted from the cathode, it cannot travel from one magnetron to the other because the magnetic field lines guide the electron to the substrate. Moreover, the electron density and electron impact ionization rate have been calculated and studied in detail for both configurations.},
  articleno    = {033018},
  author       = {Yusupov, M and Bultinck, E and Depla, Diederik and Bogaerts, A},
  issn         = {1367-2630},
  journal      = {NEW JOURNAL OF PHYSICS},
  keyword      = {PRESSURE,TRANSPORT,SIMULATION,COMBINATORIAL,DISCHARGE,FIELD,EPITAXIAL-GROWTH,UNBALANCED MAGNETRON,THIN-FILMS},
  language     = {eng},
  pages        = {17},
  title        = {Behavior of electrons in a dual-magnetron sputter deposition system: a Monte Carlo model},
  url          = {http://dx.doi.org/10.1088/1367-2630/13/3/033018},
  volume       = {13},
  year         = {2011},
}

Chicago
Yusupov, M, E Bultinck, Diederik Depla, and A Bogaerts. 2011. “Behavior of Electrons in a Dual-magnetron Sputter Deposition System: a Monte Carlo Model.” New Journal of Physics 13.
APA
Yusupov, M., Bultinck, E., Depla, D., & Bogaerts, A. (2011). Behavior of electrons in a dual-magnetron sputter deposition system: a Monte Carlo model. NEW JOURNAL OF PHYSICS, 13.
Vancouver
1.
Yusupov M, Bultinck E, Depla D, Bogaerts A. Behavior of electrons in a dual-magnetron sputter deposition system: a Monte Carlo model. NEW JOURNAL OF PHYSICS. 2011;13.
MLA
Yusupov, M, E Bultinck, Diederik Depla, et al. “Behavior of Electrons in a Dual-magnetron Sputter Deposition System: a Monte Carlo Model.” NEW JOURNAL OF PHYSICS 13 (2011): n. pag. Print.