Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-1235874

MLA

Yusupov, M., et al. “Elucidating the Asymmetric Behavior of the Discharge in a Dual Magnetron Sputter Deposition System.” APPLIED PHYSICS LETTERS, vol. 98, no. 13, 2011, doi:10.1063/1.3574365.

APA

Yusupov, M., Bultinck, E., Depla, D., & Bogaerts, A. (2011). Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system. APPLIED PHYSICS LETTERS, 98(13). https://doi.org/10.1063/1.3574365

Chicago author-date

Yusupov, M, E Bultinck, Diederik Depla, and A Bogaerts. 2011. “Elucidating the Asymmetric Behavior of the Discharge in a Dual Magnetron Sputter Deposition System.” APPLIED PHYSICS LETTERS 98 (13). https://doi.org/10.1063/1.3574365.

Chicago author-date (all authors)

Yusupov, M, E Bultinck, Diederik Depla, and A Bogaerts. 2011. “Elucidating the Asymmetric Behavior of the Discharge in a Dual Magnetron Sputter Deposition System.” APPLIED PHYSICS LETTERS 98 (13). doi:10.1063/1.3574365.

Vancouver

1.

Yusupov M, Bultinck E, Depla D, Bogaerts A. Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system. APPLIED PHYSICS LETTERS. 2011;98(13).

IEEE

[1]

M. Yusupov, E. Bultinck, D. Depla, and A. Bogaerts, “Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system,” APPLIED PHYSICS LETTERS, vol. 98, no. 13, 2011.