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Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system

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MLA
Yusupov, M et al. “Elucidating the Asymmetric Behavior of the Discharge in a Dual Magnetron Sputter Deposition System.” APPLIED PHYSICS LETTERS 98.13 (2011): n. pag. Print.
APA
Yusupov, M., Bultinck, E., Depla, D., & Bogaerts, A. (2011). Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system. APPLIED PHYSICS LETTERS, 98(13).
Chicago author-date
Yusupov, M, E Bultinck, Diederik Depla, and A Bogaerts. 2011. “Elucidating the Asymmetric Behavior of the Discharge in a Dual Magnetron Sputter Deposition System.” Applied Physics Letters 98 (13).
Chicago author-date (all authors)
Yusupov, M, E Bultinck, Diederik Depla, and A Bogaerts. 2011. “Elucidating the Asymmetric Behavior of the Discharge in a Dual Magnetron Sputter Deposition System.” Applied Physics Letters 98 (13).
Vancouver
1.
Yusupov M, Bultinck E, Depla D, Bogaerts A. Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system. APPLIED PHYSICS LETTERS. 2011;98(13).
IEEE
[1]
M. Yusupov, E. Bultinck, D. Depla, and A. Bogaerts, “Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system,” APPLIED PHYSICS LETTERS, vol. 98, no. 13, 2011.
@article{1235874,
  articleno    = {{131502}},
  author       = {{Yusupov, M and Bultinck, E and Depla, Diederik and Bogaerts, A}},
  issn         = {{0003-6951}},
  journal      = {{APPLIED PHYSICS LETTERS}},
  language     = {{eng}},
  number       = {{13}},
  pages        = {{3}},
  title        = {{Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system}},
  url          = {{http://dx.doi.org/10.1063/1.3574365}},
  volume       = {{98}},
  year         = {{2011}},
}

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