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Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system

M Yusupov, E Bultinck, Diederik Depla UGent and A Bogaerts (2011) APPLIED PHYSICS LETTERS. 98(13).
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
journal title
APPLIED PHYSICS LETTERS
Appl. Phys. Lett.
volume
98
issue
13
article_number
131502
pages
3 pages
Web of Science type
Article
Web of Science id
000289153600017
JCR category
PHYSICS, APPLIED
JCR impact factor
3.844 (2011)
JCR rank
17/124 (2011)
JCR quartile
1 (2011)
ISSN
0003-6951
DOI
10.1063/1.3574365
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
1235874
handle
http://hdl.handle.net/1854/LU-1235874
date created
2011-05-25 11:17:22
date last changed
2011-10-24 15:42:43
@article{1235874,
  articleno    = {131502},
  author       = {Yusupov, M and Bultinck, E and Depla, Diederik and Bogaerts, A},
  issn         = {0003-6951},
  journal      = {APPLIED PHYSICS LETTERS},
  language     = {eng},
  number       = {13},
  pages        = {3},
  title        = {Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system},
  url          = {http://dx.doi.org/10.1063/1.3574365},
  volume       = {98},
  year         = {2011},
}

Chicago
Yusupov, M, E Bultinck, Diederik Depla, and A Bogaerts. 2011. “Elucidating the Asymmetric Behavior of the Discharge in a Dual Magnetron Sputter Deposition System.” Applied Physics Letters 98 (13).
APA
Yusupov, M., Bultinck, E., Depla, D., & Bogaerts, A. (2011). Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system. APPLIED PHYSICS LETTERS, 98(13).
Vancouver
1.
Yusupov M, Bultinck E, Depla D, Bogaerts A. Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system. APPLIED PHYSICS LETTERS. 2011;98(13).
MLA
Yusupov, M, E Bultinck, Diederik Depla, et al. “Elucidating the Asymmetric Behavior of the Discharge in a Dual Magnetron Sputter Deposition System.” APPLIED PHYSICS LETTERS 98.13 (2011): n. pag. Print.