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Phase formation and texture of nickel silicides on Si1-xCx epilayers

(2011) MICROELECTRONIC ENGINEERING. 88(5). p.536-540
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Keywords
Silicide, Thermal stability, Carbon, Phase formation, Texture, ENHANCEMENT

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Citation

Please use this url to cite or link to this publication:

Chicago
De Keyser, Koen, Bob De Schutter, Christophe Detavernier, V Machkaoutsan, M Bauer, SG Thomas, JJ Sweet, and C Lavoie. 2011. “Phase Formation and Texture of Nickel Silicides on Si1-xCx Epilayers.” Microelectronic Engineering 88 (5): 536–540.
APA
De Keyser, Koen, De Schutter, B., Detavernier, C., Machkaoutsan, V., Bauer, M., Thomas, S., Sweet, J., et al. (2011). Phase formation and texture of nickel silicides on Si1-xCx epilayers. MICROELECTRONIC ENGINEERING, 88(5), 536–540. Presented at the International workshop on Materials for Advanced Metallization (MAM 2010).
Vancouver
1.
De Keyser K, De Schutter B, Detavernier C, Machkaoutsan V, Bauer M, Thomas S, et al. Phase formation and texture of nickel silicides on Si1-xCx epilayers. MICROELECTRONIC ENGINEERING. 2011;88(5):536–40.
MLA
De Keyser, Koen, Bob De Schutter, Christophe Detavernier, et al. “Phase Formation and Texture of Nickel Silicides on Si1-xCx Epilayers.” MICROELECTRONIC ENGINEERING 88.5 (2011): 536–540. Print.
@article{1226741,
  author       = {De Keyser, Koen and De Schutter, Bob and Detavernier, Christophe and Machkaoutsan, V and Bauer, M and Thomas, SG and Sweet, JJ and Lavoie, C},
  issn         = {0167-9317},
  journal      = {MICROELECTRONIC ENGINEERING},
  keyword      = {Silicide,Thermal stability,Carbon,Phase formation,Texture,ENHANCEMENT},
  language     = {eng},
  location     = {Mechelen, Belgium},
  number       = {5},
  pages        = {536--540},
  title        = {Phase formation and texture of nickel silicides on Si1-xCx epilayers},
  url          = {http://dx.doi.org/10.1016/j.mee.2010.06.010},
  volume       = {88},
  year         = {2011},
}

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