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Phase formation and texture of nickel silicides on Si1-xCx epilayers

Koen De Keyser UGent, Bob De Schutter UGent, Christophe Detavernier UGent, V Machkaoutsan, M Bauer, SG Thomas, JJ Sweet and C Lavoie (2011) MICROELECTRONIC ENGINEERING. 88(5). p.536-540
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (proceedingsPaper)
publication status
published
subject
keyword
Silicide, Thermal stability, Carbon, Phase formation, Texture, ENHANCEMENT
journal title
MICROELECTRONIC ENGINEERING
Microelectron. Eng.
volume
88
issue
5
pages
536 - 540
conference name
International workshop on Materials for Advanced Metallization (MAM 2010)
conference location
Mechelen, Belgium
conference start
2010-03-07
conference end
2010-03-10
Web of Science type
Proceedings Paper
Web of Science id
000289137600002
JCR category
ENGINEERING, ELECTRICAL & ELECTRONIC
JCR impact factor
1.557 (2011)
JCR rank
72/244 (2011)
JCR quartile
2 (2011)
ISSN
0167-9317
DOI
10.1016/j.mee.2010.06.010
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
1226741
handle
http://hdl.handle.net/1854/LU-1226741
date created
2011-05-18 17:47:38
date last changed
2011-05-20 10:46:11
@article{1226741,
  author       = {De Keyser, Koen and De Schutter, Bob and Detavernier, Christophe and Machkaoutsan, V and Bauer, M and Thomas, SG and Sweet, JJ and Lavoie, C},
  issn         = {0167-9317},
  journal      = {MICROELECTRONIC ENGINEERING},
  keyword      = {Silicide,Thermal stability,Carbon,Phase formation,Texture,ENHANCEMENT},
  language     = {eng},
  location     = {Mechelen, Belgium},
  number       = {5},
  pages        = {536--540},
  title        = {Phase formation and texture of nickel silicides on Si1-xCx epilayers},
  url          = {http://dx.doi.org/10.1016/j.mee.2010.06.010},
  volume       = {88},
  year         = {2011},
}

Chicago
De Keyser, Koen, Bob De Schutter, Christophe Detavernier, V Machkaoutsan, M Bauer, SG Thomas, JJ Sweet, and C Lavoie. 2011. “Phase Formation and Texture of Nickel Silicides on Si1-xCx Epilayers.” Microelectronic Engineering 88 (5): 536–540.
APA
De Keyser, Koen, De Schutter, B., Detavernier, C., Machkaoutsan, V., Bauer, M., Thomas, S., Sweet, J., et al. (2011). Phase formation and texture of nickel silicides on Si1-xCx epilayers. MICROELECTRONIC ENGINEERING, 88(5), 536–540. Presented at the International workshop on Materials for Advanced Metallization (MAM 2010).
Vancouver
1.
De Keyser K, De Schutter B, Detavernier C, Machkaoutsan V, Bauer M, Thomas S, et al. Phase formation and texture of nickel silicides on Si1-xCx epilayers. MICROELECTRONIC ENGINEERING. 2011;88(5):536–40.
MLA
De Keyser, Koen, Bob De Schutter, Christophe Detavernier, et al. “Phase Formation and Texture of Nickel Silicides on Si1-xCx Epilayers.” MICROELECTRONIC ENGINEERING 88.5 (2011): 536–540. Print.