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In situ X-ray fluorescence measurements during atomic layer deposition: nucleation and growth of TiO2 on planar substrates and in nanoporous films

(2011) JOURNAL OF PHYSICAL CHEMISTRY C. 115(14). p.6605-6610
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Organization
Abstract
Synchrotron-based X-ray fluorescence (XRF) is introduced as a promising in situ technique to monitor atomic layer deposition cycle-per-cycle. It is shown that the technique is greatly suitable to study initial nucleation on planar substrates. The initial growth of TiO2 from tetrakis(dimethylamino) titanium (TDMAT) and H2O is found to be linear on thermally grown SiO2, substrate-inhibited on H-terminated Si and substrateenhanced on atomic layer deposited Al2O3. Furthermore, in situ XRF is employed to monitor the Ti uptake during deposition of TiO2 in nanoporous silica films. In mesoporous films, the Ti content varied quadratically with the number of cycles, a behavior that is attributed to a decreasing surface area with progressing deposition. In microporous films, the MU data suggest that 1-3 ALD cycles shrunk the pore diameters below the kinetic diameter of the TDMAT molecule.
Keywords
HYDROGEN-TERMINATED SILICON, QUADRUPOLE MASS-SPECTROMETRY, QUARTZ-CRYSTAL MICROBALANCE, ELLIPSOMETRIC POROSIMETRY, TITANIUM-DIOXIDE, ALUMINUM-OXIDE, ISLAND GROWTH, THIN-FILMS, WATER, OZONE

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Citation

Please use this url to cite or link to this publication:

Chicago
Dendooven, Jolien, Sreeprasanth Pulinthanathu Sree, Koen De Keyser, Davy Deduytsche, Johan A Martens, Karl F Ludwig, and Christophe Detavernier. 2011. “In Situ X-ray Fluorescence Measurements During Atomic Layer Deposition: Nucleation and Growth of TiO2 on Planar Substrates and in Nanoporous Films.” Journal of Physical Chemistry C 115 (14): 6605–6610.
APA
Dendooven, J., Sree, S. P., De Keyser, K., Deduytsche, D., Martens, J. A., Ludwig, K. F., & Detavernier, C. (2011). In situ X-ray fluorescence measurements during atomic layer deposition: nucleation and growth of TiO2 on planar substrates and in nanoporous films. JOURNAL OF PHYSICAL CHEMISTRY C, 115(14), 6605–6610.
Vancouver
1.
Dendooven J, Sree SP, De Keyser K, Deduytsche D, Martens JA, Ludwig KF, et al. In situ X-ray fluorescence measurements during atomic layer deposition: nucleation and growth of TiO2 on planar substrates and in nanoporous films. JOURNAL OF PHYSICAL CHEMISTRY C. 2011;115(14):6605–10.
MLA
Dendooven, Jolien, Sreeprasanth Pulinthanathu Sree, Koen De Keyser, et al. “In Situ X-ray Fluorescence Measurements During Atomic Layer Deposition: Nucleation and Growth of TiO2 on Planar Substrates and in Nanoporous Films.” JOURNAL OF PHYSICAL CHEMISTRY C 115.14 (2011): 6605–6610. Print.
@article{1226728,
  abstract     = {Synchrotron-based X-ray fluorescence (XRF) is introduced as a promising in situ technique to monitor atomic layer deposition cycle-per-cycle. It is shown that the technique is greatly suitable to study initial nucleation on planar substrates. The initial growth of TiO2 from tetrakis(dimethylamino) titanium (TDMAT) and H2O is found to be linear on thermally grown SiO2, substrate-inhibited on H-terminated Si and substrateenhanced on atomic layer deposited Al2O3. Furthermore, in situ XRF is employed to monitor the Ti uptake during deposition of TiO2 in nanoporous silica films. In mesoporous films, the Ti content varied quadratically with the number of cycles, a behavior that is attributed to a decreasing surface area with progressing deposition. In microporous films, the MU data suggest that 1-3 ALD cycles shrunk the pore diameters below the kinetic diameter of the TDMAT molecule.},
  author       = {Dendooven, Jolien and Sree, Sreeprasanth Pulinthanathu and De Keyser, Koen and Deduytsche, Davy and Martens, Johan A and Ludwig, Karl F and Detavernier, Christophe},
  issn         = {1932-7447},
  journal      = {JOURNAL OF PHYSICAL CHEMISTRY C},
  keyword      = {HYDROGEN-TERMINATED SILICON,QUADRUPOLE MASS-SPECTROMETRY,QUARTZ-CRYSTAL MICROBALANCE,ELLIPSOMETRIC POROSIMETRY,TITANIUM-DIOXIDE,ALUMINUM-OXIDE,ISLAND GROWTH,THIN-FILMS,WATER,OZONE},
  language     = {eng},
  number       = {14},
  pages        = {6605--6610},
  title        = {In situ X-ray fluorescence measurements during atomic layer deposition: nucleation and growth of TiO2 on planar substrates and in nanoporous films},
  url          = {http://dx.doi.org/10.1021/jp111314b},
  volume       = {115},
  year         = {2011},
}

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