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In situ X-ray fluorescence measurements during atomic layer deposition: nucleation and growth of TiO2 on planar substrates and in nanoporous films

Jolien Dendooven UGent, Sreeprasanth Pulinthanathu Sree, Koen De Keyser UGent, Davy Deduytsche UGent, Johan A Martens, Karl F Ludwig and Christophe Detavernier UGent (2011) JOURNAL OF PHYSICAL CHEMISTRY C. 115(14). p.6605-6610
abstract
Synchrotron-based X-ray fluorescence (XRF) is introduced as a promising in situ technique to monitor atomic layer deposition cycle-per-cycle. It is shown that the technique is greatly suitable to study initial nucleation on planar substrates. The initial growth of TiO2 from tetrakis(dimethylamino) titanium (TDMAT) and H2O is found to be linear on thermally grown SiO2, substrate-inhibited on H-terminated Si and substrateenhanced on atomic layer deposited Al2O3. Furthermore, in situ XRF is employed to monitor the Ti uptake during deposition of TiO2 in nanoporous silica films. In mesoporous films, the Ti content varied quadratically with the number of cycles, a behavior that is attributed to a decreasing surface area with progressing deposition. In microporous films, the MU data suggest that 1-3 ALD cycles shrunk the pore diameters below the kinetic diameter of the TDMAT molecule.
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
HYDROGEN-TERMINATED SILICON, QUADRUPOLE MASS-SPECTROMETRY, QUARTZ-CRYSTAL MICROBALANCE, ELLIPSOMETRIC POROSIMETRY, TITANIUM-DIOXIDE, ALUMINUM-OXIDE, ISLAND GROWTH, THIN-FILMS, WATER, OZONE
journal title
JOURNAL OF PHYSICAL CHEMISTRY C
J. Phys. Chem. C
volume
115
issue
14
pages
6605 - 6610
Web of Science type
Article
Web of Science id
000289215400057
JCR category
MATERIALS SCIENCE, MULTIDISCIPLINARY
JCR impact factor
4.805 (2011)
JCR rank
23/229 (2011)
JCR quartile
1 (2011)
ISSN
1932-7447
DOI
10.1021/jp111314b
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
1226728
handle
http://hdl.handle.net/1854/LU-1226728
date created
2011-05-18 17:47:38
date last changed
2011-05-25 11:55:10
@article{1226728,
  abstract     = {Synchrotron-based X-ray fluorescence (XRF) is introduced as a promising in situ technique to monitor atomic layer deposition cycle-per-cycle. It is shown that the technique is greatly suitable to study initial nucleation on planar substrates. The initial growth of TiO2 from tetrakis(dimethylamino) titanium (TDMAT) and H2O is found to be linear on thermally grown SiO2, substrate-inhibited on H-terminated Si and substrateenhanced on atomic layer deposited Al2O3. Furthermore, in situ XRF is employed to monitor the Ti uptake during deposition of TiO2 in nanoporous silica films. In mesoporous films, the Ti content varied quadratically with the number of cycles, a behavior that is attributed to a decreasing surface area with progressing deposition. In microporous films, the MU data suggest that 1-3 ALD cycles shrunk the pore diameters below the kinetic diameter of the TDMAT molecule.},
  author       = {Dendooven, Jolien and Sree, Sreeprasanth Pulinthanathu and De Keyser, Koen and Deduytsche, Davy and Martens, Johan A and Ludwig, Karl F and Detavernier, Christophe},
  issn         = {1932-7447},
  journal      = {JOURNAL OF PHYSICAL CHEMISTRY C},
  keyword      = {HYDROGEN-TERMINATED SILICON,QUADRUPOLE MASS-SPECTROMETRY,QUARTZ-CRYSTAL MICROBALANCE,ELLIPSOMETRIC POROSIMETRY,TITANIUM-DIOXIDE,ALUMINUM-OXIDE,ISLAND GROWTH,THIN-FILMS,WATER,OZONE},
  language     = {eng},
  number       = {14},
  pages        = {6605--6610},
  title        = {In situ X-ray fluorescence measurements during atomic layer deposition: nucleation and growth of TiO2 on planar substrates and in nanoporous films},
  url          = {http://dx.doi.org/10.1021/jp111314b},
  volume       = {115},
  year         = {2011},
}

Chicago
Dendooven, Jolien, Sreeprasanth Pulinthanathu Sree, Koen De Keyser, Davy Deduytsche, Johan A Martens, Karl F Ludwig, and Christophe Detavernier. 2011. “In Situ X-ray Fluorescence Measurements During Atomic Layer Deposition: Nucleation and Growth of TiO2 on Planar Substrates and in Nanoporous Films.” Journal of Physical Chemistry C 115 (14): 6605–6610.
APA
Dendooven, J., Sree, S. P., De Keyser, K., Deduytsche, D., Martens, J. A., Ludwig, K. F., & Detavernier, C. (2011). In situ X-ray fluorescence measurements during atomic layer deposition: nucleation and growth of TiO2 on planar substrates and in nanoporous films. JOURNAL OF PHYSICAL CHEMISTRY C, 115(14), 6605–6610.
Vancouver
1.
Dendooven J, Sree SP, De Keyser K, Deduytsche D, Martens JA, Ludwig KF, et al. In situ X-ray fluorescence measurements during atomic layer deposition: nucleation and growth of TiO2 on planar substrates and in nanoporous films. JOURNAL OF PHYSICAL CHEMISTRY C. 2011;115(14):6605–10.
MLA
Dendooven, Jolien, Sreeprasanth Pulinthanathu Sree, Koen De Keyser, et al. “In Situ X-ray Fluorescence Measurements During Atomic Layer Deposition: Nucleation and Growth of TiO2 on Planar Substrates and in Nanoporous Films.” JOURNAL OF PHYSICAL CHEMISTRY C 115.14 (2011): 6605–6610. Print.