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Effect of helium partial pressure on DC-magnetron sputtering of Co-Cr films.

Huizhong Jia, Joeri Veldeman and Marc Burgelman (1999) JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS. 193(1-3). p.124-127
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
journal title
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
J. Magn. Magn. Mater.
volume
193
issue
1-3
pages
124-127 pages
Web of Science type
Article
Web of Science id
000079104600028
ISSN
0304-8853
language
English
UGent publication?
yes
classification
A1
id
117456
handle
http://hdl.handle.net/1854/LU-117456
date created
2004-01-14 13:35:00
date last changed
2016-12-19 15:36:49
@article{117456,
  author       = {Jia, Huizhong and Veldeman, Joeri and Burgelman, Marc},
  issn         = {0304-8853},
  journal      = {JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS},
  language     = {eng},
  number       = {1-3},
  pages        = {124--127},
  title        = {Effect of helium partial pressure on DC-magnetron sputtering of Co-Cr films.},
  volume       = {193},
  year         = {1999},
}

Chicago
Jia, Huizhong, Joeri Veldeman, and Marc Burgelman. 1999. “Effect of Helium Partial Pressure on DC-magnetron Sputtering of Co-Cr Films.” Journal of Magnetism and Magnetic Materials 193 (1-3): 124–127.
APA
Jia, H., Veldeman, J., & Burgelman, M. (1999). Effect of helium partial pressure on DC-magnetron sputtering of Co-Cr films. JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 193(1-3), 124–127.
Vancouver
1.
Jia H, Veldeman J, Burgelman M. Effect of helium partial pressure on DC-magnetron sputtering of Co-Cr films. JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS. 1999;193(1-3):124–7.
MLA
Jia, Huizhong, Joeri Veldeman, and Marc Burgelman. “Effect of Helium Partial Pressure on DC-magnetron Sputtering of Co-Cr Films.” JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS 193.1-3 (1999): 124–127. Print.