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The effect of argon pressure on the structural and optical characteristics of TiO2 thin films deposited by d.c. magnetron sputtering

K Eufinger, E Janssens, Hilde Poelman UGent, Dirk Poelman UGent and Roger De Gryse UGent (2006) ICTF-13/ACSIN-8, Abstracts.
Please use this url to cite or link to this publication:
author
organization
year
type
conference
publication status
published
subject
in
ICTF-13/ACSIN-8, Abstracts
conference name
13th International conference on Thin Films (ICTF-13) ; 8th Atomically Controlled Surfaces Interfaces and Nanostructures (ACSIN-8)
conference location
Stockholm, Sweden
conference start
2005-06-20
conference end
2005-06-23
language
English
UGent publication?
yes
classification
C3
id
1171467
handle
http://hdl.handle.net/1854/LU-1171467
date created
2011-02-25 14:13:21
date last changed
2017-03-09 12:38:55
@inproceedings{1171467,
  author       = {Eufinger, K and Janssens, E and Poelman, Hilde and Poelman, Dirk and De Gryse, Roger},
  booktitle    = {ICTF-13/ACSIN-8, Abstracts},
  language     = {eng},
  location     = {Stockholm, Sweden},
  title        = {The effect of argon pressure on the structural and optical characteristics of TiO2 thin films deposited by d.c. magnetron sputtering},
  year         = {2006},
}

Chicago
Eufinger, K, E Janssens, Hilde Poelman, Dirk Poelman, and Roger De Gryse. 2006. “The Effect of Argon Pressure on the Structural and Optical Characteristics of TiO2 Thin Films Deposited by D.c. Magnetron Sputtering.” In ICTF-13/ACSIN-8, Abstracts.
APA
Eufinger, K, Janssens, E., Poelman, H., Poelman, D., & De Gryse, R. (2006). The effect of argon pressure on the structural and optical characteristics of TiO2 thin films deposited by d.c. magnetron sputtering. ICTF-13/ACSIN-8, Abstracts. Presented at the 13th International conference on Thin Films (ICTF-13) ; 8th Atomically Controlled Surfaces Interfaces and Nanostructures (ACSIN-8).
Vancouver
1.
Eufinger K, Janssens E, Poelman H, Poelman D, De Gryse R. The effect of argon pressure on the structural and optical characteristics of TiO2 thin films deposited by d.c. magnetron sputtering. ICTF-13/ACSIN-8, Abstracts. 2006.
MLA
Eufinger, K, E Janssens, Hilde Poelman, et al. “The Effect of Argon Pressure on the Structural and Optical Characteristics of TiO2 Thin Films Deposited by D.c. Magnetron Sputtering.” ICTF-13/ACSIN-8, Abstracts. 2006. Print.