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The effect of argon pressure on the structural and optical characteristics of TiO2 thin films deposited by d.c. magnetron sputtering

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Chicago
Eufinger, K, E Janssens, Hilde Poelman, Dirk Poelman, and Roger De Gryse. 2006. “The Effect of Argon Pressure on the Structural and Optical Characteristics of TiO2 Thin Films Deposited by D.c. Magnetron Sputtering.” In ICTF-13/ACSIN-8, Abstracts.
APA
Eufinger, K, Janssens, E., Poelman, H., Poelman, D., & De Gryse, R. (2006). The effect of argon pressure on the structural and optical characteristics of TiO2 thin films deposited by d.c. magnetron sputtering. ICTF-13/ACSIN-8, Abstracts. Presented at the 13th International conference on Thin Films (ICTF-13) ; 8th Atomically Controlled Surfaces Interfaces and Nanostructures (ACSIN-8).
Vancouver
1.
Eufinger K, Janssens E, Poelman H, Poelman D, De Gryse R. The effect of argon pressure on the structural and optical characteristics of TiO2 thin films deposited by d.c. magnetron sputtering. ICTF-13/ACSIN-8, Abstracts. 2006.
MLA
Eufinger, K, E Janssens, Hilde Poelman, et al. “The Effect of Argon Pressure on the Structural and Optical Characteristics of TiO2 Thin Films Deposited by D.c. Magnetron Sputtering.” ICTF-13/ACSIN-8, Abstracts. 2006. Print.
@inproceedings{1171467,
  author       = {Eufinger, K and Janssens, E and Poelman, Hilde and Poelman, Dirk and De Gryse, Roger},
  booktitle    = {ICTF-13/ACSIN-8, Abstracts},
  language     = {eng},
  location     = {Stockholm, Sweden},
  title        = {The effect of argon pressure on the structural and optical characteristics of TiO2 thin films deposited by d.c. magnetron sputtering},
  year         = {2006},
}