Advanced search
Add to list

Electroreduction of Co2+ and Ni2+ at III-V semiconductors and properties of the semiconductor/metal interfaces formed

Author
Organization

Citation

Please use this url to cite or link to this publication:

MLA
Strubbe, Katrien, et al. “Electroreduction of Co2+ and Ni2+ at III-V Semiconductors and Properties of the Semiconductor/Metal Interfaces Formed.” JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 146, no. 4, 1999, pp. 1412–20.
APA
Strubbe, K., Vereecken, P., & Gomes, W. (1999). Electroreduction of Co2+ and Ni2+ at III-V semiconductors and properties of the semiconductor/metal interfaces formed. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 146(4), 1412–1420.
Chicago author-date
Strubbe, Katrien, Philippe Vereecken, and Walter Gomes. 1999. “Electroreduction of Co2+ and Ni2+ at III-V Semiconductors and Properties of the Semiconductor/Metal Interfaces Formed.” JOURNAL OF THE ELECTROCHEMICAL SOCIETY 146 (4): 1412–20.
Chicago author-date (all authors)
Strubbe, Katrien, Philippe Vereecken, and Walter Gomes. 1999. “Electroreduction of Co2+ and Ni2+ at III-V Semiconductors and Properties of the Semiconductor/Metal Interfaces Formed.” JOURNAL OF THE ELECTROCHEMICAL SOCIETY 146 (4): 1412–1420.
Vancouver
1.
Strubbe K, Vereecken P, Gomes W. Electroreduction of Co2+ and Ni2+ at III-V semiconductors and properties of the semiconductor/metal interfaces formed. JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 1999;146(4):1412–20.
IEEE
[1]
K. Strubbe, P. Vereecken, and W. Gomes, “Electroreduction of Co2+ and Ni2+ at III-V semiconductors and properties of the semiconductor/metal interfaces formed,” JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 146, no. 4, pp. 1412–1420, 1999.
@article{112054,
  author       = {{Strubbe, Katrien and Vereecken, Philippe and Gomes, Walter}},
  issn         = {{0013-4651}},
  journal      = {{JOURNAL OF THE ELECTROCHEMICAL SOCIETY}},
  language     = {{eng}},
  number       = {{4}},
  pages        = {{1412--1420}},
  title        = {{Electroreduction of Co2+ and Ni2+ at III-V semiconductors and properties of the semiconductor/metal interfaces formed}},
  volume       = {{146}},
  year         = {{1999}},
}

Web of Science
Times cited: