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In situ scanning tunneling microscopy characterization of step bunching on miscut Si(111) surfaces in fluoride solutions.

PM HOFFMANN, Inge Vermeir, A NATARAJAN and PC SEARSON (1999) JOURNAL OF APPLIED PHYSICS. 85(3). p.1545-1549
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
journal title
JOURNAL OF APPLIED PHYSICS
J. Appl. Phys.
volume
85
issue
3
pages
1545-1549 pages
Web of Science type
Article
Web of Science id
000078137100037
ISSN
0021-8979
language
English
UGent publication?
yes
classification
A1
id
112038
handle
http://hdl.handle.net/1854/LU-112038
date created
2004-01-14 13:34:00
date last changed
2018-01-29 12:12:31
@article{112038,
  author       = {HOFFMANN, PM and Vermeir, Inge and NATARAJAN, A and SEARSON, PC},
  issn         = {0021-8979},
  journal      = {JOURNAL OF APPLIED PHYSICS},
  language     = {eng},
  number       = {3},
  pages        = {1545--1549},
  title        = {In situ scanning tunneling microscopy characterization of step bunching on miscut Si(111) surfaces in fluoride solutions.},
  volume       = {85},
  year         = {1999},
}

Chicago
HOFFMANN, PM, Inge Vermeir, A NATARAJAN, and PC SEARSON. 1999. “In Situ Scanning Tunneling Microscopy Characterization of Step Bunching on Miscut Si(111) Surfaces in Fluoride Solutions.” Journal of Applied Physics 85 (3): 1545–1549.
APA
HOFFMANN, P., Vermeir, I., NATARAJAN, A., & SEARSON, P. (1999). In situ scanning tunneling microscopy characterization of step bunching on miscut Si(111) surfaces in fluoride solutions. JOURNAL OF APPLIED PHYSICS, 85(3), 1545–1549.
Vancouver
1.
HOFFMANN P, Vermeir I, NATARAJAN A, SEARSON P. In situ scanning tunneling microscopy characterization of step bunching on miscut Si(111) surfaces in fluoride solutions. JOURNAL OF APPLIED PHYSICS. 1999;85(3):1545–9.
MLA
HOFFMANN, PM, Inge Vermeir, A NATARAJAN, et al. “In Situ Scanning Tunneling Microscopy Characterization of Step Bunching on Miscut Si(111) Surfaces in Fluoride Solutions.” JOURNAL OF APPLIED PHYSICS 85.3 (1999): 1545–1549. Print.