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In situ scanning tunneling microscopy characterization of step bunching on miscut Si(111) surfaces in fluoride solutions.

(1999) JOURNAL OF APPLIED PHYSICS. 85(3). p.1545-1549
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Chicago
HOFFMANN, PM, Inge Vermeir, A NATARAJAN, and PC SEARSON. 1999. “In Situ Scanning Tunneling Microscopy Characterization of Step Bunching on Miscut Si(111) Surfaces in Fluoride Solutions.” Journal of Applied Physics 85 (3): 1545–1549.
APA
HOFFMANN, P., Vermeir, I., NATARAJAN, A., & SEARSON, P. (1999). In situ scanning tunneling microscopy characterization of step bunching on miscut Si(111) surfaces in fluoride solutions. JOURNAL OF APPLIED PHYSICS, 85(3), 1545–1549.
Vancouver
1.
HOFFMANN P, Vermeir I, NATARAJAN A, SEARSON P. In situ scanning tunneling microscopy characterization of step bunching on miscut Si(111) surfaces in fluoride solutions. JOURNAL OF APPLIED PHYSICS. 1999;85(3):1545–9.
MLA
HOFFMANN, PM, Inge Vermeir, A NATARAJAN, et al. “In Situ Scanning Tunneling Microscopy Characterization of Step Bunching on Miscut Si(111) Surfaces in Fluoride Solutions.” JOURNAL OF APPLIED PHYSICS 85.3 (1999): 1545–1549. Print.
@article{112038,
  author       = {HOFFMANN, PM and Vermeir, Inge and NATARAJAN, A and SEARSON, PC},
  issn         = {0021-8979},
  journal      = {JOURNAL OF APPLIED PHYSICS},
  language     = {eng},
  number       = {3},
  pages        = {1545--1549},
  title        = {In situ scanning tunneling microscopy characterization of step bunching on miscut Si(111) surfaces in fluoride solutions.},
  volume       = {85},
  year         = {1999},
}

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