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Nanoporous organosilica thin filmsfor applications as low-k material

Frederik Goethals (UGent) , Pascal Van Der Voort (UGent) and Isabel Van Driessche (UGent)
(2009) Doctoraatssymposium Faculteit Wetenschappen UGent, Abstracts.
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Citation

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MLA
Goethals, Frederik, et al. “Nanoporous Organosilica Thin Filmsfor Applications as Low-k Material.” Doctoraatssymposium Faculteit Wetenschappen UGent, Abstracts, Universiteit Gent. Faculteit Wetenschappen, 2009.
APA
Goethals, F., Van Der Voort, P., & Van Driessche, I. (2009). Nanoporous organosilica thin filmsfor applications as low-k material. In Doctoraatssymposium Faculteit Wetenschappen UGent, Abstracts. Gent: Universiteit Gent. Faculteit Wetenschappen.
Chicago author-date
Goethals, Frederik, Pascal Van Der Voort, and Isabel Van Driessche. 2009. “Nanoporous Organosilica Thin Filmsfor Applications as Low-k Material.” In Doctoraatssymposium Faculteit Wetenschappen UGent, Abstracts. Universiteit Gent. Faculteit Wetenschappen.
Chicago author-date (all authors)
Goethals, Frederik, Pascal Van Der Voort, and Isabel Van Driessche. 2009. “Nanoporous Organosilica Thin Filmsfor Applications as Low-k Material.” In Doctoraatssymposium Faculteit Wetenschappen UGent, Abstracts. Universiteit Gent. Faculteit Wetenschappen.
Vancouver
1.
Goethals F, Van Der Voort P, Van Driessche I. Nanoporous organosilica thin filmsfor applications as low-k material. In: Doctoraatssymposium Faculteit Wetenschappen UGent, Abstracts. Universiteit Gent. Faculteit Wetenschappen; 2009.
IEEE
[1]
F. Goethals, P. Van Der Voort, and I. Van Driessche, “Nanoporous organosilica thin filmsfor applications as low-k material,” in Doctoraatssymposium Faculteit Wetenschappen UGent, Abstracts, Gent, 2009.
@inproceedings{1090159,
  author       = {{Goethals, Frederik and Van Der Voort, Pascal and Van Driessche, Isabel}},
  booktitle    = {{Doctoraatssymposium Faculteit Wetenschappen UGent, Abstracts}},
  language     = {{eng}},
  location     = {{Gent}},
  publisher    = {{Universiteit Gent. Faculteit Wetenschappen}},
  title        = {{Nanoporous organosilica thin filmsfor applications as low-k material}},
  year         = {{2009}},
}