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SiGe MEMS technology: a platform technology enabling different demonstrators

Ann Witvrouw, Rita Van Hoof, George Bryce, Bert Du Bois, Agnes Verbist, Simone Severi, Luc Haspeslagh, Haris Osman, Jeroen De Coster and Lianggong Wen, et al. (2010) ECS Transactions. 33(6). p.799-812
abstract
In imec's 200mm fab a dedicated poly-SiGe above-IC MEMS (Micro Electro-Mechanical Systems) platform has been set up to integrate MEMS and its readout and driving electronics on one chip. In the Flemish project Gemini the possibilities of this platform have been further explored together with the project partners. Three different demonstrators were realized: mirrors for display applications, grating light valves (GLV) and accelerometers. Whereas the mirrors and GLVs are made with a similar to 300 nm thick SiGe structural layer plus optical coating, the SiGe structural layer thickness for the accelerometers is 4 mu m in order to improve the capacitive readout of in-plane devices. The processing and measurement results of these functional demonstrators are shown in this paper. These new demonstrators reconfirm the generic nature of the SiGe MEMS platform.
Please use this url to cite or link to this publication:
author
organization
year
type
conference
publication status
published
subject
in
ECS Transactions
ECS Trans.
editor
D Harame, J Boquet, M Östling, Y Yeo, G Masini, M Caymax, T Krishnamohan, B Tillack, S Bedell, S Miyazaki, A Reznicek and S Koester
volume
33
issue
6
issue title
SiGe, Ge, and related compounds, 4 : materials, processing, and devices
pages
799 - 812
publisher
Electrochemical Society (ECS)
place of publication
Pennington, NJ, USA
conference name
218th ECS Meeting
conference location
Las Vegas, NV, USA
conference start
2010-10-10
conference end
2010-10-15
Web of Science type
Proceedings Paper
Web of Science id
000314957600081
ISSN
1938-5862
DOI
10.1149/1.3487610
language
English
UGent publication?
yes
classification
P1
additional info
invited paper
copyright statement
I have transferred the copyright for this publication to the publisher
id
1057335
handle
http://hdl.handle.net/1854/LU-1057335
date created
2010-10-11 12:17:09
date last changed
2013-04-08 13:02:35
@inproceedings{1057335,
  abstract     = {In imec's 200mm fab a dedicated poly-SiGe above-IC MEMS (Micro Electro-Mechanical Systems) platform has been set up to integrate MEMS and its readout and driving electronics on one chip. In the Flemish project Gemini the possibilities of this platform have been further explored together with the project partners. Three different demonstrators were realized: mirrors for display applications, grating light valves (GLV) and accelerometers. Whereas the mirrors and GLVs are made with a similar to 300 nm thick SiGe structural layer plus optical coating, the SiGe structural layer thickness for the accelerometers is 4 mu m in order to improve the capacitive readout of in-plane devices. The processing and measurement results of these functional demonstrators are shown in this paper. These new demonstrators reconfirm the generic nature of the SiGe MEMS platform.},
  author       = {Witvrouw, Ann and Van Hoof, Rita and Bryce, George and Du Bois, Bert and Verbist, Agnes and Severi, Simone and Haspeslagh, Luc and Osman, Haris and De Coster, Jeroen and Wen, Lianggong and Puers, Robert and Beernaert, Roel and De Smet, Herbert and Rudra, Sukumar and Van Thourhout, Dries},
  booktitle    = {ECS Transactions},
  editor       = {Harame, D and Boquet, J and {\"O}stling, M and Yeo, Y and Masini, G and Caymax, M and Krishnamohan, T and Tillack, B and Bedell, S and Miyazaki, S and Reznicek, A and Koester, S},
  issn         = {1938-5862},
  language     = {eng},
  location     = {Las Vegas, NV, USA},
  number       = {6},
  pages        = {799--812},
  publisher    = {Electrochemical Society (ECS)},
  title        = {SiGe MEMS technology: a platform technology enabling different demonstrators},
  url          = {http://dx.doi.org/10.1149/1.3487610},
  volume       = {33},
  year         = {2010},
}

Chicago
Witvrouw, Ann, Rita Van Hoof, George Bryce, Bert Du Bois, Agnes Verbist, Simone Severi, Luc Haspeslagh, et al. 2010. “SiGe MEMS Technology: a Platform Technology Enabling Different Demonstrators.” In ECS Transactions, ed. D Harame, J Boquet, M Östling, Y Yeo, G Masini, M Caymax, T Krishnamohan, et al., 33:799–812. Pennington, NJ, USA: Electrochemical Society (ECS).
APA
Witvrouw, A., Van Hoof, R., Bryce, G., Du Bois, B., Verbist, A., Severi, S., Haspeslagh, L., et al. (2010). SiGe MEMS technology: a platform technology enabling different demonstrators. In D. Harame, J. Boquet, M. Östling, Y. Yeo, G. Masini, M. Caymax, T. Krishnamohan, et al. (Eds.), ECS Transactions (Vol. 33, pp. 799–812). Presented at the 218th ECS Meeting, Pennington, NJ, USA: Electrochemical Society (ECS).
Vancouver
1.
Witvrouw A, Van Hoof R, Bryce G, Du Bois B, Verbist A, Severi S, et al. SiGe MEMS technology: a platform technology enabling different demonstrators. In: Harame D, Boquet J, Östling M, Yeo Y, Masini G, Caymax M, et al., editors. ECS Transactions. Pennington, NJ, USA: Electrochemical Society (ECS); 2010. p. 799–812.
MLA
Witvrouw, Ann, Rita Van Hoof, George Bryce, et al. “SiGe MEMS Technology: a Platform Technology Enabling Different Demonstrators.” ECS Transactions. Ed. D Harame et al. Vol. 33. Pennington, NJ, USA: Electrochemical Society (ECS), 2010. 799–812. Print.