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An in-situ monitor to measure the momentum flux during physical vapour deposition

Stijn Mahieu (UGent) and Diederik Depla (UGent)
(2010) SURFACE & COATINGS TECHNOLOGY. 204(12-13). p.2085-2088
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Keywords
ION, INCIDENT, SUBSTRATE, TORSION BALANCE, MAGNETRON SPUTTER-DEPOSITION, Magnetron sputtering, Monitoring tool, Momentum flux, SURFACE, GROWTH, FILMS, FIELD, TIN

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Citation

Please use this url to cite or link to this publication:

Chicago
Mahieu, Stijn, and Diederik Depla. 2010. “An In-situ Monitor to Measure the Momentum Flux During Physical Vapour Deposition.” Surface & Coatings Technology 204 (12-13): 2085–2088.
APA
Mahieu, Stijn, & Depla, D. (2010). An in-situ monitor to measure the momentum flux during physical vapour deposition. SURFACE & COATINGS TECHNOLOGY, 204(12-13), 2085–2088. Presented at the Symposium on Protective Coatings and Thin Films held at the 2009 E-MRS Spring Meeting.
Vancouver
1.
Mahieu S, Depla D. An in-situ monitor to measure the momentum flux during physical vapour deposition. SURFACE & COATINGS TECHNOLOGY. 2010;204(12-13):2085–8.
MLA
Mahieu, Stijn, and Diederik Depla. “An In-situ Monitor to Measure the Momentum Flux During Physical Vapour Deposition.” SURFACE & COATINGS TECHNOLOGY 204.12-13 (2010): 2085–2088. Print.
@article{1055700,
  author       = {Mahieu, Stijn and Depla, Diederik},
  issn         = {0257-8972},
  journal      = {SURFACE \& COATINGS TECHNOLOGY},
  keyword      = {ION,INCIDENT,SUBSTRATE,TORSION BALANCE,MAGNETRON SPUTTER-DEPOSITION,Magnetron sputtering,Monitoring tool,Momentum flux,SURFACE,GROWTH,FILMS,FIELD,TIN},
  language     = {eng},
  location     = {Strasbourg, France},
  number       = {12-13},
  pages        = {2085--2088},
  title        = {An in-situ monitor to measure the momentum flux during physical vapour deposition},
  url          = {http://dx.doi.org/10.1016/j.surfcoat.2009.08.033},
  volume       = {204},
  year         = {2010},
}

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