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An in-situ monitor to measure the momentum flux during physical vapour deposition

Stijn Mahieu UGent and Diederik Depla UGent (2010) SURFACE & COATINGS TECHNOLOGY. 204(12-13). p.2085-2088
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (proceedingsPaper)
publication status
published
subject
keyword
ION, INCIDENT, SUBSTRATE, TORSION BALANCE, MAGNETRON SPUTTER-DEPOSITION, Magnetron sputtering, Monitoring tool, Momentum flux, SURFACE, GROWTH, FILMS, FIELD, TIN
journal title
SURFACE & COATINGS TECHNOLOGY
Surf. Coat. Technol.
volume
204
issue
12-13
pages
2085 - 2088
conference name
Symposium on Protective Coatings and Thin Films held at the 2009 E-MRS Spring Meeting
conference location
Strasbourg, France
conference start
2009-06-08
conference end
2009-06-12
Web of Science type
Proceedings Paper
Web of Science id
000275692100046
JCR category
MATERIALS SCIENCE, COATINGS & FILMS
JCR impact factor
2.135 (2010)
JCR rank
2/18 (2010)
JCR quartile
1 (2010)
ISSN
0257-8972
DOI
10.1016/j.surfcoat.2009.08.033
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
1055700
handle
http://hdl.handle.net/1854/LU-1055700
date created
2010-10-08 10:33:14
date last changed
2016-12-19 15:46:27
@article{1055700,
  author       = {Mahieu, Stijn and Depla, Diederik},
  issn         = {0257-8972},
  journal      = {SURFACE \& COATINGS TECHNOLOGY},
  keyword      = {ION,INCIDENT,SUBSTRATE,TORSION BALANCE,MAGNETRON SPUTTER-DEPOSITION,Magnetron sputtering,Monitoring tool,Momentum flux,SURFACE,GROWTH,FILMS,FIELD,TIN},
  language     = {eng},
  location     = {Strasbourg, France},
  number       = {12-13},
  pages        = {2085--2088},
  title        = {An in-situ monitor to measure the momentum flux during physical vapour deposition},
  url          = {http://dx.doi.org/10.1016/j.surfcoat.2009.08.033},
  volume       = {204},
  year         = {2010},
}

Chicago
Mahieu, Stijn, and Diederik Depla. 2010. “An In-situ Monitor to Measure the Momentum Flux During Physical Vapour Deposition.” Surface & Coatings Technology 204 (12-13): 2085–2088.
APA
Mahieu, Stijn, & Depla, D. (2010). An in-situ monitor to measure the momentum flux during physical vapour deposition. SURFACE & COATINGS TECHNOLOGY, 204(12-13), 2085–2088. Presented at the Symposium on Protective Coatings and Thin Films held at the 2009 E-MRS Spring Meeting.
Vancouver
1.
Mahieu S, Depla D. An in-situ monitor to measure the momentum flux during physical vapour deposition. SURFACE & COATINGS TECHNOLOGY. 2010;204(12-13):2085–8.
MLA
Mahieu, Stijn, and Diederik Depla. “An In-situ Monitor to Measure the Momentum Flux During Physical Vapour Deposition.” SURFACE & COATINGS TECHNOLOGY 204.12-13 (2010): 2085–2088. Print.