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Rotating cylindrical magnetron sputtering: simulation of the reactive process

Diederik Depla (UGent) , Xiuyang Li, Stijn Mahieu (UGent) , Koen Van Aeken (UGent) , Wouter Leroy (UGent) , Johan Haemers (UGent) , Roger De Gryse (UGent) and Annemie Bogaerts
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Keywords
chemisorption, VOLTAGE, sputter deposition, GAS

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Citation

Please use this url to cite or link to this publication:

MLA
Depla, Diederik, Xiuyang Li, Stijn Mahieu, et al. “Rotating Cylindrical Magnetron Sputtering: Simulation of the Reactive Process.” JOURNAL OF APPLIED PHYSICS 107.11 (2010): n. pag. Print.
APA
Depla, D., Li, X., Mahieu, S., Van Aeken, K., Leroy, W., Haemers, J., De Gryse, R., et al. (2010). Rotating cylindrical magnetron sputtering: simulation of the reactive process. JOURNAL OF APPLIED PHYSICS, 107(11).
Chicago author-date
Depla, Diederik, Xiuyang Li, Stijn Mahieu, Koen Van Aeken, Wouter Leroy, Johan Haemers, Roger De Gryse, and Annemie Bogaerts. 2010. “Rotating Cylindrical Magnetron Sputtering: Simulation of the Reactive Process.” Journal of Applied Physics 107 (11).
Chicago author-date (all authors)
Depla, Diederik, Xiuyang Li, Stijn Mahieu, Koen Van Aeken, Wouter Leroy, Johan Haemers, Roger De Gryse, and Annemie Bogaerts. 2010. “Rotating Cylindrical Magnetron Sputtering: Simulation of the Reactive Process.” Journal of Applied Physics 107 (11).
Vancouver
1.
Depla D, Li X, Mahieu S, Van Aeken K, Leroy W, Haemers J, et al. Rotating cylindrical magnetron sputtering: simulation of the reactive process. JOURNAL OF APPLIED PHYSICS. 2010;107(11).
IEEE
[1]
D. Depla et al., “Rotating cylindrical magnetron sputtering: simulation of the reactive process,” JOURNAL OF APPLIED PHYSICS, vol. 107, no. 11, 2010.
@article{1055683,
  articleno    = {113307},
  author       = {Depla, Diederik and Li, Xiuyang and Mahieu, Stijn and Van Aeken, Koen and Leroy, Wouter and Haemers, Johan and De Gryse, Roger and Bogaerts, Annemie},
  issn         = {0021-8979},
  journal      = {JOURNAL OF APPLIED PHYSICS},
  keywords     = {chemisorption,VOLTAGE,sputter deposition,GAS},
  language     = {eng},
  number       = {11},
  pages        = {9},
  title        = {Rotating cylindrical magnetron sputtering: simulation of the reactive process},
  url          = {http://dx.doi.org/10.1063/1.3415550},
  volume       = {107},
  year         = {2010},
}

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