Advanced search
1 file | 307.85 KB

Rotating cylindrical magnetron sputtering: simulation of the reactive process

Diederik Depla (UGent) , Xiuyang Li, Stijn Mahieu (UGent) , Koen Van Aeken (UGent) , Wouter Leroy (UGent) , Johan Haemers (UGent) , Roger De Gryse (UGent) and Annemie Bogaerts
Author
Organization
Keywords
chemisorption, VOLTAGE, sputter deposition, GAS

Downloads

  • (...).pdf
    • full text
    • |
    • UGent only
    • |
    • PDF
    • |
    • 307.85 KB

Citation

Please use this url to cite or link to this publication:

Chicago
Depla, Diederik, Xiuyang Li, Stijn Mahieu, Koen Van Aeken, Wouter Leroy, Johan Haemers, Roger De Gryse, and Annemie Bogaerts. 2010. “Rotating Cylindrical Magnetron Sputtering: Simulation of the Reactive Process.” Journal of Applied Physics 107 (11).
APA
Depla, D., Li, X., Mahieu, S., Van Aeken, K., Leroy, W., Haemers, J., De Gryse, R., et al. (2010). Rotating cylindrical magnetron sputtering: simulation of the reactive process. JOURNAL OF APPLIED PHYSICS, 107(11).
Vancouver
1.
Depla D, Li X, Mahieu S, Van Aeken K, Leroy W, Haemers J, et al. Rotating cylindrical magnetron sputtering: simulation of the reactive process. JOURNAL OF APPLIED PHYSICS. 2010;107(11).
MLA
Depla, Diederik, Xiuyang Li, Stijn Mahieu, et al. “Rotating Cylindrical Magnetron Sputtering: Simulation of the Reactive Process.” JOURNAL OF APPLIED PHYSICS 107.11 (2010): n. pag. Print.
@article{1055683,
  articleno    = {113307},
  author       = {Depla, Diederik and Li, Xiuyang and Mahieu, Stijn and Van Aeken, Koen and Leroy, Wouter and Haemers, Johan and De Gryse, Roger and Bogaerts, Annemie},
  issn         = {0021-8979},
  journal      = {JOURNAL OF APPLIED PHYSICS},
  language     = {eng},
  number       = {11},
  pages        = {9},
  title        = {Rotating cylindrical magnetron sputtering: simulation of the reactive process},
  url          = {http://dx.doi.org/10.1063/1.3415550},
  volume       = {107},
  year         = {2010},
}

Altmetric
View in Altmetric
Web of Science
Times cited: