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Mechanistic aspects of selective laser patterning of multilayered thin-film structures in OLED fabrication

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Abstract
Selective laser patterning of OLEDs on flexible substrates represents a novel optical engineering challenge. Here we discuss the potential of ultrafast diode-pumped solid-state (DPSS) and UV excimer lasers for this application and demonstrate a stable process window for large area OLED patterning. We specifically studied the removal of transparent conductive layers on barrier layer and, metal electrodes on active OLED layer and report on laser damage thresholds, resulting feature quality and process speed limitations. Careful examination with optical profilometry and SEM reveals that the choice of laser wavelength and more importantly laser pulse duration is key for this applicaiton. A photomechanical stress-induced ablation mechanism is believed to be driving this process, resulting in debris-free, low temperature patterning with demonstrably no detrimental effects to the OLED performance.

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Chicago
Karnakis, Dimitris, Geert Van Steenberge, An Gielen, Johan De Baets, and Jeroen van den Brand. 2010. “Mechanistic Aspects of Selective Laser Patterning of Multilayered Thin-film Structures in OLED Fabrication.” In Proceedings of LOPE-C 2010. Frankfurt am Main, Germany: Organic Electronics Association (OE-A).
APA
Karnakis, D., Van Steenberge, G., Gielen, A., De Baets, J., & van den Brand, J. (2010). Mechanistic aspects of selective laser patterning of multilayered thin-film structures in OLED fabrication. Proceedings of LOPE-C 2010. Presented at the Large-area, Organic and Printed Electronics (LOPE-C) 2010, Frankfurt am Main, Germany: Organic Electronics Association (OE-A).
Vancouver
1.
Karnakis D, Van Steenberge G, Gielen A, De Baets J, van den Brand J. Mechanistic aspects of selective laser patterning of multilayered thin-film structures in OLED fabrication. Proceedings of LOPE-C 2010. Frankfurt am Main, Germany: Organic Electronics Association (OE-A); 2010.
MLA
Karnakis, Dimitris, Geert Van Steenberge, An Gielen, et al. “Mechanistic Aspects of Selective Laser Patterning of Multilayered Thin-film Structures in OLED Fabrication.” Proceedings of LOPE-C 2010. Frankfurt am Main, Germany: Organic Electronics Association (OE-A), 2010. Print.
@inproceedings{1047087,
  abstract     = {Selective laser patterning of OLEDs on flexible substrates represents a novel optical engineering challenge.  Here we discuss the potential of ultrafast diode-pumped solid-state (DPSS) and UV excimer lasers for this application and demonstrate a stable process window for large area OLED patterning. We specifically studied the removal of transparent conductive layers on barrier layer and, metal electrodes on active OLED layer and report on laser damage thresholds, resulting feature quality and process speed limitations. Careful examination with optical profilometry and SEM reveals that the choice of laser wavelength and more importantly laser pulse duration is key for this applicaiton.  A photomechanical stress-induced ablation mechanism is believed to be driving this process, resulting in debris-free, low temperature patterning with demonstrably no detrimental effects to the OLED performance.},
  author       = {Karnakis, Dimitris and Van Steenberge, Geert and Gielen, An and De Baets, Johan and van den Brand, Jeroen},
  booktitle    = {Proceedings of LOPE-C 2010},
  isbn         = {9783000299551},
  language     = {eng},
  location     = {Frankfurt am Main, Germany},
  pages        = {5},
  publisher    = {Organic Electronics Association (OE-A)},
  title        = {Mechanistic aspects of selective laser patterning of multilayered thin-film structures in OLED fabrication},
  year         = {2010},
}