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Texture of atomic layer deposited ruthenium

(2010) MICROELECTRONIC ENGINEERING. 87(10). p.1879-1883
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Keywords
Atomic layer deposition, Ruthenium, Texture, Silicide, Ammonia plasma, RU THIN-FILMS, GROWTH

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Citation

Please use this url to cite or link to this publication:

Chicago
Musschoot, Jan, Qi Xie, Davy Deduytsche, Koen De Keyser, Delphine Longrie, Johan Haemers, Sven Van den Berghe, Roland Van Meirhaeghe, Jan D’Haen, and Christophe Detavernier. 2010. “Texture of Atomic Layer Deposited Ruthenium.” Microelectronic Engineering 87 (10): 1879–1883.
APA
Musschoot, J., Xie, Q., Deduytsche, D., De Keyser, K., Longrie, D., Haemers, J., Van den Berghe, S., et al. (2010). Texture of atomic layer deposited ruthenium. MICROELECTRONIC ENGINEERING, 87(10), 1879–1883.
Vancouver
1.
Musschoot J, Xie Q, Deduytsche D, De Keyser K, Longrie D, Haemers J, et al. Texture of atomic layer deposited ruthenium. MICROELECTRONIC ENGINEERING. 2010;87(10):1879–83.
MLA
Musschoot, Jan, Qi Xie, Davy Deduytsche, et al. “Texture of Atomic Layer Deposited Ruthenium.” MICROELECTRONIC ENGINEERING 87.10 (2010): 1879–1883. Print.
@article{1007853,
  author       = {Musschoot, Jan and Xie, Qi and Deduytsche, Davy and De Keyser, Koen and Longrie, Delphine and Haemers, Johan and Van den Berghe, Sven and Van Meirhaeghe, Roland and D'Haen, Jan and Detavernier, Christophe},
  issn         = {0167-9317},
  journal      = {MICROELECTRONIC ENGINEERING},
  keyword      = {Atomic layer deposition,Ruthenium,Texture,Silicide,Ammonia plasma,RU THIN-FILMS,GROWTH},
  language     = {eng},
  number       = {10},
  pages        = {1879--1883},
  title        = {Texture of atomic layer deposited ruthenium},
  url          = {http://dx.doi.org/10.1016/j.mee.2009.11.020},
  volume       = {87},
  year         = {2010},
}

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