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Texture of atomic layer deposited ruthenium

Jan Musschoot UGent, Qi Xie UGent, Davy Deduytsche UGent, Koen De Keyser UGent, Delphine Longrie UGent, Johan Haemers UGent, Sven Van den Berghe, Roland Van Meirhaeghe, Jan D'Haen and Christophe Detavernier UGent (2010) MICROELECTRONIC ENGINEERING. 87(10). p.1879-1883
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
Atomic layer deposition, Ruthenium, Texture, Silicide, Ammonia plasma, RU THIN-FILMS, GROWTH
journal title
MICROELECTRONIC ENGINEERING
Microelectron. Eng.
volume
87
issue
10
pages
1879 - 1883
Web of Science type
Article
Web of Science id
000280046900012
JCR category
ENGINEERING, ELECTRICAL & ELECTRONIC
JCR impact factor
1.569 (2010)
JCR rank
66/247 (2010)
JCR quartile
2 (2010)
ISSN
0167-9317
DOI
10.1016/j.mee.2009.11.020
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
1007853
handle
http://hdl.handle.net/1854/LU-1007853
date created
2010-07-09 12:53:13
date last changed
2010-08-11 15:16:47
@article{1007853,
  author       = {Musschoot, Jan and Xie, Qi and Deduytsche, Davy and De Keyser, Koen and Longrie, Delphine and Haemers, Johan and Van den Berghe, Sven and Van Meirhaeghe, Roland and D'Haen, Jan and Detavernier, Christophe},
  issn         = {0167-9317},
  journal      = {MICROELECTRONIC ENGINEERING},
  keyword      = {Atomic layer deposition,Ruthenium,Texture,Silicide,Ammonia plasma,RU THIN-FILMS,GROWTH},
  language     = {eng},
  number       = {10},
  pages        = {1879--1883},
  title        = {Texture of atomic layer deposited ruthenium},
  url          = {http://dx.doi.org/10.1016/j.mee.2009.11.020},
  volume       = {87},
  year         = {2010},
}

Chicago
Musschoot, Jan, Qi Xie, Davy Deduytsche, Koen De Keyser, Delphine Longrie, Johan Haemers, Sven Van den Berghe, Roland Van Meirhaeghe, Jan D’Haen, and Christophe Detavernier. 2010. “Texture of Atomic Layer Deposited Ruthenium.” Microelectronic Engineering 87 (10): 1879–1883.
APA
Musschoot, J., Xie, Q., Deduytsche, D., De Keyser, K., Longrie, D., Haemers, J., Van den Berghe, S., et al. (2010). Texture of atomic layer deposited ruthenium. MICROELECTRONIC ENGINEERING, 87(10), 1879–1883.
Vancouver
1.
Musschoot J, Xie Q, Deduytsche D, De Keyser K, Longrie D, Haemers J, et al. Texture of atomic layer deposited ruthenium. MICROELECTRONIC ENGINEERING. 2010;87(10):1879–83.
MLA
Musschoot, Jan, Qi Xie, Davy Deduytsche, et al. “Texture of Atomic Layer Deposited Ruthenium.” MICROELECTRONIC ENGINEERING 87.10 (2010): 1879–1883. Print.