@article{01K8JDSYRQ1MSEY85EYCNXWEVH,
  abstract     = {{Tungsten thin films were grown at a constant discharge power using direct current magnetron sputter deposition. The study presents three series of experiments. Firstly, the discharge voltage was increased by lowering the magnetic field strength above the target surface. Secondly, experiments were performed at different argon pressures and target–substrate distances to investigate the role of gas scattering. Finally, in-situ film resistance measurements were performed to probe the early stages of the film growth. The trends observed in phase composition, as determined by X-ray diffraction, can be correlated with the number of displacements scaled to the number of deposited W atoms. The latter gauge was calculated based on test particle Monte Carlo simulations. The simulations show that only the backscattered neutrals define the phase composition of W thin films, as the maximal energy of the sputtered atoms is much lower than the displacement energy threshold. The resistance measurements indicate that the phase selection takes already present at the early stages of the film growth.}},
  articleno    = {{164938}},
  author       = {{Ahangarani Farahani, Farzaneh and Akagawa, M. and Shimizu, T. and Depla, Diederik}},
  issn         = {{0169-4332}},
  journal      = {{APPLIED SURFACE SCIENCE}},
  keywords     = {{Magnetron sputtering,Tungsten,Reflected neutrals,Discharge voltage,ELECTRICAL-RESISTIVITY,ENHANCED PROPERTIES,DISCHARGE VOLTAGE,MAGNETRON,ENERGY,MICROSTRUCTURE,STRESS,THERMALIZATION,BOMBARDMENT,STRAIN}},
  language     = {{eng}},
  pages        = {{8}},
  title        = {{The role of backscattered neutrals on the phase composition of sputter deposited tungsten thin films}},
  url          = {{http://doi.org/10.1016/j.apsusc.2025.164938}},
  volume       = {{718}},
  year         = {{2026}},
}

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