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Centimetre-scale micro-transfer printing to enable heterogeneous integration of thin film lithium niobate with silicon photonics

Margot Niels (UGent) , Tom Vanackere (UGent) , Tom Vandekerckhove (UGent) , Stijn Poelman (UGent) , Tom Reep (UGent) , Günther Roelkens (UGent) , Maximilien Billet (UGent) and Bart Kuyken (UGent)
(2025) OPTICAL MATERIALS EXPRESS. 15(3). p.531-540
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Abstract
The integrated photonics CMOS-compatible silicon nitride (SiN) platform is praised for its low propagation loss but is limited by its lack of active functionalities such as a strong Pockels coefficient and intrinsic chi(2) nonlinearity. In this paper, we demonstrate the integration of centimetre-long thin-film lithium niobate (TFLN) devices on a SiN platform using the micro- transfer printing (mu TP) method. At a wavelength of 1550 nm, propagation losses of approximately 0.9 dB/cm and transition losses of 1.8 dB per facet were measured. Furthermore, the TFLN was integrated into an imbalanced push-pull Mach-Zehnder modulator, achieving a V pi of 3.2 V. The electro-optic nature of the observed modulation is confirmed by measuring the device up to 35 GHz, showing that the printing does not affect the high-speed LN properties. (c) 2025 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement
Keywords
NITRIDE, CIRCUITS

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MLA
Niels, Margot, et al. “Centimetre-Scale Micro-Transfer Printing to Enable Heterogeneous Integration of Thin Film Lithium Niobate with Silicon Photonics.” OPTICAL MATERIALS EXPRESS, vol. 15, no. 3, 2025, pp. 531–40, doi:10.1364/OME.551748.
APA
Niels, M., Vanackere, T., Vandekerckhove, T., Poelman, S., Reep, T., Roelkens, G., … Kuyken, B. (2025). Centimetre-scale micro-transfer printing to enable heterogeneous integration of thin film lithium niobate with silicon photonics. OPTICAL MATERIALS EXPRESS, 15(3), 531–540. https://doi.org/10.1364/OME.551748
Chicago author-date
Niels, Margot, Tom Vanackere, Tom Vandekerckhove, Stijn Poelman, Tom Reep, Günther Roelkens, Maximilien Billet, and Bart Kuyken. 2025. “Centimetre-Scale Micro-Transfer Printing to Enable Heterogeneous Integration of Thin Film Lithium Niobate with Silicon Photonics.” OPTICAL MATERIALS EXPRESS 15 (3): 531–40. https://doi.org/10.1364/OME.551748.
Chicago author-date (all authors)
Niels, Margot, Tom Vanackere, Tom Vandekerckhove, Stijn Poelman, Tom Reep, Günther Roelkens, Maximilien Billet, and Bart Kuyken. 2025. “Centimetre-Scale Micro-Transfer Printing to Enable Heterogeneous Integration of Thin Film Lithium Niobate with Silicon Photonics.” OPTICAL MATERIALS EXPRESS 15 (3): 531–540. doi:10.1364/OME.551748.
Vancouver
1.
Niels M, Vanackere T, Vandekerckhove T, Poelman S, Reep T, Roelkens G, et al. Centimetre-scale micro-transfer printing to enable heterogeneous integration of thin film lithium niobate with silicon photonics. OPTICAL MATERIALS EXPRESS. 2025;15(3):531–40.
IEEE
[1]
M. Niels et al., “Centimetre-scale micro-transfer printing to enable heterogeneous integration of thin film lithium niobate with silicon photonics,” OPTICAL MATERIALS EXPRESS, vol. 15, no. 3, pp. 531–540, 2025.
@article{01K06ZX2GNVHRJKGA8SHC4SWBC,
  abstract     = {{The integrated photonics CMOS-compatible silicon nitride (SiN) platform is praised for its low propagation loss but is limited by its lack of active functionalities such as a strong Pockels coefficient and intrinsic chi(2) nonlinearity. In this paper, we demonstrate the integration of centimetre-long thin-film lithium niobate (TFLN) devices on a SiN platform using the micro- transfer printing (mu TP) method. At a wavelength of 1550 nm, propagation losses of approximately 0.9 dB/cm and transition losses of 1.8 dB per facet were measured. Furthermore, the TFLN was integrated into an imbalanced push-pull Mach-Zehnder modulator, achieving a V pi of 3.2 V. The electro-optic nature of the observed modulation is confirmed by measuring the device up to 35 GHz, showing that the printing does not affect the high-speed LN properties. (c) 2025 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement}},
  author       = {{Niels, Margot and Vanackere, Tom and Vandekerckhove, Tom and Poelman, Stijn and Reep, Tom and Roelkens, Günther and Billet, Maximilien and Kuyken, Bart}},
  issn         = {{2159-3930}},
  journal      = {{OPTICAL MATERIALS EXPRESS}},
  keywords     = {{NITRIDE,CIRCUITS}},
  language     = {{eng}},
  number       = {{3}},
  pages        = {{531--540}},
  title        = {{Centimetre-scale micro-transfer printing to enable heterogeneous integration of thin film lithium niobate with silicon photonics}},
  url          = {{http://doi.org/10.1364/OME.551748}},
  volume       = {{15}},
  year         = {{2025}},
}
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