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Calculation of oxide sputter yields

Diederik Depla (UGent) and Josja Van Bever (UGent)
(2024) VACUUM. 222.
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Abstract
An existing semi -empirical model to calculate the compound sputter yields is used to fit a large set of literature data on oxide sputter yields which consists of data for 21 different materials, and 65 datasets. The dedicated fitting procedure enables to link the surface binding energy of the metal and oxygen atoms with the oxide cohesive energy. This approach resolves a long standing problem in the research community on the accurate prediction of oxide sputter yields.
Keywords
Surfaces, Coatings and Films, Condensed Matter Physics, Instrumentation, Modeling, Magnetron, Reactive sputtering, ALUMINUM-OXIDE, ENERGY, RATES, BOMBARDMENT, SIMULATION, COMPUTER, ARGON, FILMS

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Citation

Please use this url to cite or link to this publication:

MLA
Depla, Diederik, and Josja Van Bever. “Calculation of Oxide Sputter Yields.” VACUUM, vol. 222, 2024, doi:10.1016/j.vacuum.2024.112994.
APA
Depla, D., & Van Bever, J. (2024). Calculation of oxide sputter yields. VACUUM, 222. https://doi.org/10.1016/j.vacuum.2024.112994
Chicago author-date
Depla, Diederik, and Josja Van Bever. 2024. “Calculation of Oxide Sputter Yields.” VACUUM 222. https://doi.org/10.1016/j.vacuum.2024.112994.
Chicago author-date (all authors)
Depla, Diederik, and Josja Van Bever. 2024. “Calculation of Oxide Sputter Yields.” VACUUM 222. doi:10.1016/j.vacuum.2024.112994.
Vancouver
1.
Depla D, Van Bever J. Calculation of oxide sputter yields. VACUUM. 2024;222.
IEEE
[1]
D. Depla and J. Van Bever, “Calculation of oxide sputter yields,” VACUUM, vol. 222, 2024.
@article{01HN0EVQ4K9X7ZKEMNFYB2R2RP,
  abstract     = {{An existing semi -empirical model to calculate the compound sputter yields is used to fit a large set of literature data on oxide sputter yields which consists of data for 21 different materials, and 65 datasets. The dedicated fitting procedure enables to link the surface binding energy of the metal and oxygen atoms with the oxide cohesive energy. This approach resolves a long standing problem in the research community on the accurate prediction of oxide sputter yields.}},
  articleno    = {{112994}},
  author       = {{Depla, Diederik and Van Bever, Josja}},
  issn         = {{0042-207X}},
  journal      = {{VACUUM}},
  keywords     = {{Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Modeling,Magnetron,Reactive sputtering,ALUMINUM-OXIDE,ENERGY,RATES,BOMBARDMENT,SIMULATION,COMPUTER,ARGON,FILMS}},
  language     = {{eng}},
  pages        = {{7}},
  title        = {{Calculation of oxide sputter yields}},
  url          = {{http://doi.org/10.1016/j.vacuum.2024.112994}},
  volume       = {{222}},
  year         = {{2024}},
}
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