Lateral selective epitaxial SiGe growth for locally dislocation-free virtual substrate fabrication
- Author
- Yuji Yamamoto, Wei-Chen Wen, Markus Andreas Schubert, Agnieszka Anna Corley-Wiciak, Sho Sugawa, Yuta Ito, Ryo Yokogawa, Han Han, Roger Loo (UGent) , Atsushi Ogura and Bernd Tillack
- Organization
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Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-01HKMMRH56B54D1EEK1FWJPYDZ
- MLA
- Yamamoto, Yuji, et al. “Lateral Selective Epitaxial SiGe Growth for Locally Dislocation-Free Virtual Substrate Fabrication.” 14th International Workshop on New Group IV Semiconductor Nanoelectronics, Proceedings, 2023.
- APA
- Yamamoto, Y., Wen, W.-C., Schubert, M. A., Corley-Wiciak, A. A., Sugawa, S., Ito, Y., … Tillack, B. (2023). Lateral selective epitaxial SiGe growth for locally dislocation-free virtual substrate fabrication. 14th International Workshop on New Group IV Semiconductor Nanoelectronics, Proceedings. Presented at the 14th International WorkShop on New Group IV Semiconductor Nanoelectronics, Sendai, Japan.
- Chicago author-date
- Yamamoto, Yuji, Wei-Chen Wen, Markus Andreas Schubert, Agnieszka Anna Corley-Wiciak, Sho Sugawa, Yuta Ito, Ryo Yokogawa, et al. 2023. “Lateral Selective Epitaxial SiGe Growth for Locally Dislocation-Free Virtual Substrate Fabrication.” In 14th International Workshop on New Group IV Semiconductor Nanoelectronics, Proceedings.
- Chicago author-date (all authors)
- Yamamoto, Yuji, Wei-Chen Wen, Markus Andreas Schubert, Agnieszka Anna Corley-Wiciak, Sho Sugawa, Yuta Ito, Ryo Yokogawa, Han Han, Roger Loo, Atsushi Ogura, and Bernd Tillack. 2023. “Lateral Selective Epitaxial SiGe Growth for Locally Dislocation-Free Virtual Substrate Fabrication.” In 14th International Workshop on New Group IV Semiconductor Nanoelectronics, Proceedings.
- Vancouver
- 1.Yamamoto Y, Wen W-C, Schubert MA, Corley-Wiciak AA, Sugawa S, Ito Y, et al. Lateral selective epitaxial SiGe growth for locally dislocation-free virtual substrate fabrication. In: 14th International workshop on New Group IV Semiconductor Nanoelectronics, Proceedings. 2023.
- IEEE
- [1]Y. Yamamoto et al., “Lateral selective epitaxial SiGe growth for locally dislocation-free virtual substrate fabrication,” in 14th International workshop on New Group IV Semiconductor Nanoelectronics, Proceedings, Sendai, Japan, 2023.
@inproceedings{01HKMMRH56B54D1EEK1FWJPYDZ,
author = {{Yamamoto, Yuji and Wen, Wei-Chen and Schubert, Markus Andreas and Corley-Wiciak, Agnieszka Anna and Sugawa, Sho and Ito, Yuta and Yokogawa, Ryo and Han, Han and Loo, Roger and Ogura, Atsushi and Tillack, Bernd}},
booktitle = {{14th International workshop on New Group IV Semiconductor Nanoelectronics, Proceedings}},
language = {{eng}},
location = {{Sendai, Japan}},
pages = {{2}},
title = {{Lateral selective epitaxial SiGe growth for locally dislocation-free virtual substrate fabrication}},
year = {{2023}},
}