
Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering
- Author
- Josja Van Bever (UGent) , Koen Strijckmans (UGent) and Diederik Depla (UGent)
- Organization
- Project
- Abstract
- Process curves that are obtained during reactive magnetron sputtering can exhibit a double S-shape, also termed a double hysteresis. A previous study mainly focused on the relationship between the double shape behavior and the reaction kinetics of implanted reactive ions, although chemisorption also defines the target condition. As a follow-up study, the influence of chemisorption on double hysteresis is computationally studied by high-throughput calculations using a state-of-the-art model for reactive sputtering. The analysis reveals that the magnitude of the double hysteresis is a conserved quantity for the chemisorption driven reactions at the substrate level. At the target level, a balance between compound formation by direct reactive ion implantation and chemisorption is established. A minimal condition for double hysteresis is derived and process conditions are identified for which the double hysteresis can be measured for target materials prone to strong chemisorption of the reactive gas. The condition can assist to further explore the close interplay between chemisorption and implantation during reactive sputtering.
- Keywords
- Surfaces, Coatings and Films, Condensed Matter Physics, Surfaces and Interfaces, General Physics and Astronomy, General Chemistry, Reactive sputtering, Target poisoning, Modeling
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Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-01GM5Q2ZKTWJ1ADEY42XHP274Y
- MLA
- Van Bever, Josja, et al. “Influence of Chemisorption on the Double Hysteresis Phenomenon during Reactive Sputtering.” APPLIED SURFACE SCIENCE, vol. 613, 2023, doi:10.1016/j.apsusc.2022.155901.
- APA
- Van Bever, J., Strijckmans, K., & Depla, D. (2023). Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering. APPLIED SURFACE SCIENCE, 613. https://doi.org/10.1016/j.apsusc.2022.155901
- Chicago author-date
- Van Bever, Josja, Koen Strijckmans, and Diederik Depla. 2023. “Influence of Chemisorption on the Double Hysteresis Phenomenon during Reactive Sputtering.” APPLIED SURFACE SCIENCE 613. https://doi.org/10.1016/j.apsusc.2022.155901.
- Chicago author-date (all authors)
- Van Bever, Josja, Koen Strijckmans, and Diederik Depla. 2023. “Influence of Chemisorption on the Double Hysteresis Phenomenon during Reactive Sputtering.” APPLIED SURFACE SCIENCE 613. doi:10.1016/j.apsusc.2022.155901.
- Vancouver
- 1.Van Bever J, Strijckmans K, Depla D. Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering. APPLIED SURFACE SCIENCE. 2023;613.
- IEEE
- [1]J. Van Bever, K. Strijckmans, and D. Depla, “Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering,” APPLIED SURFACE SCIENCE, vol. 613, 2023.
@article{01GM5Q2ZKTWJ1ADEY42XHP274Y, abstract = {{Process curves that are obtained during reactive magnetron sputtering can exhibit a double S-shape, also termed a double hysteresis. A previous study mainly focused on the relationship between the double shape behavior and the reaction kinetics of implanted reactive ions, although chemisorption also defines the target condition. As a follow-up study, the influence of chemisorption on double hysteresis is computationally studied by high-throughput calculations using a state-of-the-art model for reactive sputtering. The analysis reveals that the magnitude of the double hysteresis is a conserved quantity for the chemisorption driven reactions at the substrate level. At the target level, a balance between compound formation by direct reactive ion implantation and chemisorption is established. A minimal condition for double hysteresis is derived and process conditions are identified for which the double hysteresis can be measured for target materials prone to strong chemisorption of the reactive gas. The condition can assist to further explore the close interplay between chemisorption and implantation during reactive sputtering.}}, articleno = {{155901}}, author = {{Van Bever, Josja and Strijckmans, Koen and Depla, Diederik}}, issn = {{0169-4332}}, journal = {{APPLIED SURFACE SCIENCE}}, keywords = {{Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry,Reactive sputtering,Target poisoning,Modeling}}, language = {{eng}}, pages = {{7}}, title = {{Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering}}, url = {{http://doi.org/10.1016/j.apsusc.2022.155901}}, volume = {{613}}, year = {{2023}}, }
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