Ghent University Academic Bibliography


Project: Investigation of etching mechanisms at semiconductor surfaces.

project duration
01-JAN-00 – 31-DEC-99
The purpose is to gain fundamental knowledge concerning the rates, the mechanisms and the morphological aspects of etching processes at semiconductors in darkness as well as under illumination by performing experimental research in which the resultsof etch rate measurements as a function of different variables will be combined with electrochemical data as well as with morphological data concerning the etched surfaces.