Project: A fundamental study on the metallization of semiconductor surfaces from electrolyte solutions and on the interfaces formed.
- project duration
- 01-JAN-94 – 31-DEC-99
- The purpose of the proposed research is to determine, by means of various experimental techniques, which are the factors controlling the rates of metal deposition processes from electrolyte solutions upon semiconductor surfaces and the structural and electrical properties of the interfaces formed. On the basis of the results obtained, metallization mechanisms will be proposed, the current theories for Schottky barriers will be checked and the barrier characteristics will be optimized.