Atomic layer epitaxy for thin film el...
Project: Atomic layer epitaxy for thin film electroluminescent displays.
01-JAN-99 – 31-DEC-01
- In the ELIS department an apparatus for the deposition of thin insulating, semi-conducting or photoluminescent films has been purchased. Different gasses are consecutively led into the reaction chamber and each time an atomic layer of material is deposited on the substrate. The reactor is used for making electroluminescent test cells and photoluminescent layers.