Project: Development of an in-situ flux energy flux analysator and flux monitor, to study the growth of thin films deposited by physical vapor deposition
- project duration
- 01-JAN-08 – 31-DEC-10
- Two techniques will be developed to measure all fluxes towards the substrate during deposition. They should allow to model the energy flux, momentum flux and material flux towards the substrate as a function of the used deposition conditions. Comparing the properties of thin films deposited at similar conditions, should allow the user to investigate the fundamental aspects of thin film growth.