Project: Study of silicide/semiconductor contacts and thin films fabricated by magnetron reactive and magnetron co-sputtering.
- project duration
- 01-JAN-00 – 31-DEC-99
- The fabrication and characterization of silicide/GaAs Schottky diodes capable to resist high anneal temperatures, using magnetron co-sputter deposition. Epitaxial growth of compound semiconductor and multilayered insulating films by magnetron sputtering.