Project: A fundamental study of nucleation and grain growth in thin layers
- project duration
- 01-JAN-03 – 31-OCT-08
- A first part of this proposal contains a study of the influence of alloy elements on nucleation in solids. Our model, developed for CoSi2, will be applied on NiSi2 and amorphous Si. In the second part of our project, microstructure, e.g. grain size, of thin films (e.g. Cu) will be varied by changing deposition variables, postdeposition processing and alloying.