prof. dr. Jolien Dendooven

Journal Article

Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films

Femi Mathew (UGent) , Nithin Poonkottil (UGent) , Eduardo Solano Minuesa (UGent) , Dirk Poelman (UGent) , Zeger Hens (UGent) , Christophe Detavernier (UGent) and Jolien Dendooven (UGent)

(2023) Journal of Vacuum Science & Technology A. 41(6).

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Journal Article

Atomic layer deposition of yttrium oxide as a protective coating for lithium metal anodes

Bo Zhao, Jin Li, Maxime Guillaume, Veronique Cremers, Lowie Henderick (UGent) , Jolien Dendooven (UGent) and Christophe Detavernier (UGent)

(2023) DALTON TRANSACTIONS. 52(21). p.7302-7310

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Depositing ALD-oxides on MLD-metalcones : enhancing initial growth through O2 plasma densification

Juan Santo-Domingo Peñaranda (UGent) , Matthias Minjauw (UGent) , Sofie Vandenbroucke (UGent) , Robin Petit (UGent) , Jin Li (UGent) , Jolien Dendooven (UGent) and Christophe Detavernier (UGent)

(2023) EuroCVD 23 - Baltic ALD 17, Conference abstracts.

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Depositing ALD-oxides on MLD-metalcones : enhancing initial growth through O2 plasma densification

Juan Santo-Domingo Peñaranda (UGent) , Matthias Minjauw (UGent) , Sofie Vandenbroucke (UGent) , Robin Petit (UGent) , Jin Li (UGent) , Jolien Dendooven (UGent) and Christophe Detavernier (UGent)

(2023) DALTON TRANSACTIONS. 52(21). p.7219-7224

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Miscellaneous

Metal nanocatalyst sintering interrogated at complementary length scales (Small 5/2023)

Eduardo Solano, Jolien Dendooven (UGent) , Davy Deduytsche (UGent) , Nithin Poonkottil (UGent) , Ji-Yu Feng, Maarten B. J. Roeffaers, Christophe Detavernier (UGent) and Matthias Filez (UGent)

(2023) SMALL. 19(5).

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Journal Article
A1
open access

Metal nanocatalyst sintering interrogated at complementary length scales

Eduardo Solano, Jolien Dendooven (UGent) , Davy Deduytsche (UGent) , Nithin Poonkottil (UGent) , Ji-Yu Feng, Maarten B. J. Roeffaers, Christophe Detavernier (UGent) and Matthias Filez (UGent)

(2023) SMALL. 19(5).

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Conference Paper

Interrogating metal nanocatalyst sintering at complementary length scales

Matthias Filez (UGent) , Eduardo Solano Minuesa (UGent) , Jolien Dendooven (UGent) , Maarten Roeffaers and Christophe Detavernier (UGent)

(2023)

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Conference Paper
C3
open access

Tin and indium sulfide by plasma-enhanced atomic layer deposition for CO2 electroreduction

Femi Mathew (UGent) , Järi Van Den Hoek, Nithin Poonkottil (UGent) , Geert Rampelberg (UGent) , Nick Daems, Jonas Hereijgers, Zeger Hens (UGent) , Tom Breugelmans, Christophe Detavernier (UGent) and Jolien Dendooven (UGent)

(2023) EuroCVD 23 - Baltic ALD 17, Conference abstracts. p.171-172

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In vacuo XPS study of Al2O3 ALD deposition processes on n-GaN

Sofie Vandenbroucke (UGent) , Eldad Bahat Treidel, Liad Tadmor, Enrico Brusaterra, Paul Plate, Nicole Bickel, Frank Brunner, Joachim Würfl, Oliver Hilt, Jolien Dendooven (UGent) , et al.

(2023) EuroCVD 23 - Baltic ALD 17, Conference abstracts.

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Journal Article
A1
open access

Low temperature area selective atomic layer deposition of ruthenium dioxide thin films using polymers as inhibition layers

Nithin Poonkottil (UGent) , Hannes Rijckaert (UGent) , Khannan Rajendran (UGent) , Robin Petit (UGent) , Lisa Martin (UGent) , Dries Van Thourhout (UGent) , Isabel Van Driessche (UGent) , Christophe Detavernier (UGent) and Jolien Dendooven (UGent)

(2023) ADVANCED MATERIALS INTERFACES. 10(5).

Academic Bibliography

prof. dr. Jolien Dendooven

Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films

Atomic layer deposition of yttrium oxide as a protective coating for lithium metal anodes

Depositing ALD-oxides on MLD-metalcones : enhancing initial growth through O2 plasma densification

Depositing ALD-oxides on MLD-metalcones : enhancing initial growth through O2 plasma densification

Metal nanocatalyst sintering interrogated at complementary length scales (Small 5/2023)

Metal nanocatalyst sintering interrogated at complementary length scales

Interrogating metal nanocatalyst sintering at complementary length scales

Tin and indium sulfide by plasma-enhanced atomic layer deposition for CO2 electroreduction

In vacuo XPS study of Al2O3 ALD deposition processes on n-GaN

Low temperature area selective atomic layer deposition of ruthenium dioxide thin films using polymers as inhibition layers

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