- ORCID iD
- 0000-0002-2385-3693
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Role of the oxidizing co-reactant in Pt growth by atomic layer deposition using MeCpPtMe3 and O2/O3/O2-plasma
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Atomic layer deposition for tuning the surface chemical composition of nickel iron phosphates for oxygen evolution reaction in alkaline electrolyzers
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- Journal Article
- A1
- open access
Advancing beyond Sabatier : strategies for dynamic synthetic catalysis
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- Journal Article
- A1
- open access
Catalysts made from vapour
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- Journal Article
- A1
- open access
Controlling Pt nanoparticle sintering by sub-monolayer MgO ALD thin films
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Transient APXPS as a tool to characterize the kinetics of alloy restructuring : application to Sn-poor PtSn ALD-derived nanoparticles
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- Journal Article
- A1
- open access
Crystalline tin disulfide by low-temperature plasma-enhanced 2 atomic layer deposition as an electrode material for Li-ion batteries 3 and CO2 electroreduction
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- Journal Article
- A1
- open access
Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films
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- Journal Article
- A1
- open access
Atomic layer deposition of yttrium oxide as a protective coating for lithium metal anodes
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Depositing ALD-oxides on MLD-metalcones : enhancing initial growth through O2 plasma densification