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Mik met een relanceplan op vaste kosten en investeringen
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Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate
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Atomic layer deposition of titanium and vanadium oxide on mesoporous silica and phenol/formaldehyde resins : the effect of the support on the liquid phase epoxidation of cyclohexene
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- Journal Article
- A1
- open access
The coordinatively saturated vanadium MIL-47 as a low leaching heterogeneous catalyst in the oxidation of cyclohexene
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- PhD Thesis
- open access
Advantages and challenges of plasma enhanced atomic layer deposition
(2011) -
TaCN growth with PDMAT and H-2/Ar plasma by plasma enhanced atomic layer deposition
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- Journal Article
- A1
- open access
TiO2/HfO2 bi-layer gate stacks grown by atomic layer deposition for germanium-based metal-oxide-semiconductor devices using GeOxNy passivation layer
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- Conference Paper
- C3
- open access
Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition
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Ultrathin GeOxNy interlayer formed by in situ NH3 plasma pretreatment for passivation of germanium metal-oxide-semiconductor devices
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Texture of atomic layer deposited ruthenium
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Qualitative model of the magnetron discharge
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Conformality of Al2O3 and AlN deposited by plasma-enhanced atomic layer deposition
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- Conference Paper
- C3
- open access
Modeling the conformality of atomic layer deposition: the effect of sticking probability
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Ru thin film grown on TaN by plasma enhanced atomic layer deposition
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Microencapsulation of Moisture-Sensitive CaS:Eu2+ Particles with Aluminum Oxide
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Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide
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Modeling the conformality of atomic layer deposition: the effect of sticking probability
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Atomic layer deposition of titanium nitride from TDMAT precursor
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- Conference Paper
- C3
- open access
Conformality of thermal and plasma enhanced ALD
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Thermal versus plasma-enhanced ALD : growth kinetics and conformality