- ORCID iD
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0000-0001-6606-2480
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The measurement and impact of negative oxygen ions during reactive sputter deposition
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Plasmonic effects in the neutralization of slow ions at a metallic surface
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On the role of chemisorption in the formation of the target surface compound layer during reactive magnetron sputtering
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- Journal Article
- A1
- open access
Analysis of stress in sputter-deposited films using a kinetic model for Cu, Ni, Co, Cr, Mo, W
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- Journal Article
- A1
- open access
Linking simulated polycrystalline thin film microstructures to physical vapor deposition conditions
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- Journal Article
- A1
- open access
Cell behavior changes and enzymatic biodegradation of hybrid electrospun poly(3-hydroxybutyrate)-based scaffolds with an enhanced piezoresponse after the addition of reduced graphene oxide
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- Journal Article
- A1
- open access
Effect of growth temperature and atmosphere exposure time on impurity incorporation in sputtered Mg, Al, and Ca thin films
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- Journal Article
- A1
- open access
Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering
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- Journal Article
- A1
- open access
Chemical stability of sputter deposited silver thin films
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- Journal Article
- A1
- open access
Effect of processing conditions on residual stress in sputtered transition metal nitrides (TiN, ZrN and TaN) : experiments and modeling