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- Journal Article
- A1
- open access
Atomic layer deposition of boron-containing layers using a combined trimethylborate- and water-based plasma
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- Journal Article
- A1
- open access
Vapour phase deposition of phosphonate-containing alumina thin films using dimethyl vinylphosphonate as precursor
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- Journal Article
- A1
- open access
Atomic layer deposition of lithium borate and lithium borophosphate for lithium-ion batteries
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Molecular layer deposition of metal organophosphonate thin films
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- Conference Paper
- C3
- open access
Atomic layer deposition of lithium borate and borophosphate thin films for lithium-ion battery applications
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- Conference Paper
- C3
- open access
Atomic layer deposition of lithium borate and borophosphate thin films for lithium-ion battery applications
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- Conference Paper
- C3
- open access
Atomic layer deposition of lithium borate and borophosphate thin films for lithium-ion battery applications
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- Conference Paper
- C3
- open access
Strategies to produce boron-containing ALD thin films using trimethyl borate precursor : from thermal to plasma to combined-plasma approach
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- Journal Article
- A1
- open access
Atomic layer deposition of metal phosphates
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Surface reactions between LiHMDS, TMA and TMP leading to deposition of amorphous lithium phosphate