Walter Gonçalez Filho
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Electrical stability of MOS structures with AlON and Al2O3 dielectrics deposited on n-and p-type GaN
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Mg activation anneal of the p-GaN body in trench gate MOSFETs and its effect on channel mobility and threshold voltage stability
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- Journal Article
- A1
- open access
Development and analysis of thick GaN drift layers on 200 mm CTE-matched substrate for vertical device processing
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High-temperature PBTI in trench-gate vertical GaN power MOSFETs : role of border and semiconductor traps
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Design and characterization of p-body layer of vertical GaN devices on engineered substrates