- ORCID iD
- 0000-0003-3796-0024
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Atomic Layer Deposition for Stable InP-Based On-Chip Quantum Dot microLEDs: Hybrid Quantum Dot Pockets
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- Conference Paper
- C3
- open access
Strategies to produce boron-containing ALD thin films using trimethyl borate precursor : from thermal to plasma to combined-plasma approach
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Atomic layer deposition of ruthenium dioxide thin films using RuO4 and alcohols as reactants
(2022) -
- Journal Article
- A1
- open access
Atomic layer deposition of ruthenium dioxide based on redox reactions between alcohols and ruthenium tetroxide
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- Journal Article
- A1
- open access
Atomic layer deposition of metal phosphates
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Surface reactions between LiHMDS, TMA and TMP leading to deposition of amorphous lithium phosphate
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- Journal Article
- A1
- open access
Selective vapor-phase doping of Pt nanoparticles into phase-controlled nanoalloys
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- Journal Article
- A1
- open access
Plasma-enhanced atomic layer deposition : correlating O2 plasma parameters and species to blister formation and conformal film growth
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- Conference Paper
- C3
- open access
Converting molecular layer deposited alucone films into Al2O3/alucone hybrid multilayers by plasma densification
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Atomic layer deposition of ruthenium dioxide thin films using RuO4 and alcohols as reactants