Jan Musschoot

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Mik met een relanceplan op vaste kosten en investeringen

Jan Musschoot and Hans Bevers

(2020) DE TIJD.
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- Journal Article
- A1
Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate

Jan Musschoot, Jolien Dendooven (UGent) , Davy Deduytsche (UGent) , Johan Haemers (UGent) , G Buyle and Christophe Detavernier (UGent)

(2012) SURFACE & COATINGS TECHNOLOGY. 206(22). p.4511-4517
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- Journal Article
- A1
Atomic layer deposition of titanium and vanadium oxide on mesoporous silica and phenol/formaldehyde resins : the effect of the support on the liquid phase epoxidation of cyclohexene

Ilke Muylaert (UGent) , Jan Musschoot, Karen Leus (UGent) , Jolien Dendooven (UGent) , Christophe Detavernier (UGent) and Pascal Van Der Voort (UGent)

(2012) EUROPEAN JOURNAL OF INORGANIC CHEMISTRY. p.251-260
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- Journal Article
- A1
- open access
The coordinatively saturated vanadium MIL-47 as a low leaching heterogeneous catalyst in the oxidation of cyclohexene

Karen Leus (UGent) , Matthias Vandichel (UGent) , Ying-Ya Liu (UGent) , Ilke Muylaert (UGent) , Jan Musschoot, Steven Pyl (UGent) , Henk Vrielinck (UGent) , Freddy Callens (UGent) , Guy Marin (UGent) , Christophe Detavernier (UGent) , et al.

(2012) JOURNAL OF CATALYSIS. 285(1). p.196-207
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- PhD Thesis
- open access
Advantages and challenges of plasma enhanced atomic layer deposition

Jan Musschoot

(2011)
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- Journal Article
- A1
TaCN growth with PDMAT and H-2/Ar plasma by plasma enhanced atomic layer deposition

Qi Xie (UGent) , Davy Deduytsche (UGent) , Jan Musschoot, Roland Vanmeirhaeghe (UGent) , Christophe Detavernier (UGent) , Shao-Feng Ding and Xin-Ping Qu

(2011) MICROELECTRONIC ENGINEERING. 88(5). p.646-650
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- Journal Article
- A1
- open access
TiO2/HfO2 bi-layer gate stacks grown by atomic layer deposition for germanium-based metal-oxide-semiconductor devices using GeOxNy passivation layer

Qi Xie (UGent) , Jan Musschoot, Marc Schaekers, Matty Caymax, Annelies Delabie, Dennis Lin, Xin-Ping Qu, Yu-Long Jiang, Sven Van den Berghe and Christophe Detavernier (UGent)

(2011) ELECTROCHEMICAL AND SOLID STATE LETTERS. 14(5). p.G27-G30
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- Conference Paper
- C3
- open access
Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition

Jolien Dendooven (UGent) , Davy Deduytsche (UGent) , Jan Musschoot and Christophe Detavernier (UGent)

(2010) Atomic Layer Deposition, 10th International conference, Abstracts.
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- Journal Article
- A1
Ultrathin GeOxNy interlayer formed by in situ NH3 plasma pretreatment for passivation of germanium metal-oxide-semiconductor devices

Qi Xie (UGent) , Jan Musschoot, Marc Schaekers, Matty Caymax, Annelies Delabie, Xin-Ping Qu, Yy-Long Jiang, Sven Van den Berghe, JunHu Liu and Christophe Detavernier (UGent)

(2010) APPLIED PHYSICS LETTERS. 97(22).
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- Journal Article
- A1
Texture of atomic layer deposited ruthenium

Jan Musschoot, Qi Xie (UGent) , Davy Deduytsche (UGent) , Koen De Keyser, Delphine Longrie (UGent) , Johan Haemers (UGent) , Sven Van den Berghe, Roland Van Meirhaeghe, Jan D'Haen and Christophe Detavernier (UGent)

(2010) MICROELECTRONIC ENGINEERING. 87(10). p.1879-1883
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- Journal Article
- A1
Qualitative model of the magnetron discharge

Jan Musschoot and Johan Haemers (UGent)

(2010) VACUUM. 84(4). p.488-493
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- Journal Article
- A1
Conformality of Al2O3 and AlN deposited by plasma-enhanced atomic layer deposition

Jolien Dendooven (UGent) , Davy Deduytsche (UGent) , Jan Musschoot, Roland Vanmeirhaeghe (UGent) and Christophe Detavernier (UGent)

(2010) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 157(4). p.G111-G116
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- Conference Paper
- C3
- open access
Modeling the conformality of atomic layer deposition: the effect of sticking probability

Jolien Dendooven (UGent) , Jan Musschoot, Davy Deduytsche (UGent) , Roland Vanmeirhaeghe (UGent) and Christophe Detavernier (UGent)

(2009) Atomic Layer Deposition, 9th Baltic conference.
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- Journal Article
- A1
Ru thin film grown on TaN by plasma enhanced atomic layer deposition

Qi Xie (UGent) , YL Jiang, Jan Musschoot, Davy Deduytsche (UGent) , Christophe Detavernier (UGent) , Roland Vanmeirhaeghe (UGent) , S Van den Berghe, GP Ru, BZ Li and XP Qu

(2009) THIN SOLID FILMS. 517(16). p.4689-4693
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- Journal Article
- A1
Microencapsulation of Moisture-Sensitive CaS:Eu2+ Particles with Aluminum Oxide

Nursen Avci (UGent) , Jan Musschoot, Philippe Smet (UGent) , Katleen Korthout (UGent) , Aykut Avci (UGent) , Christophe Detavernier (UGent) and Dirk Poelman (UGent)

(2009) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 156(11). p.J333-J337
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- Journal Article
- A1
Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide

Jan Musschoot, Davy Deduytsche (UGent) , Hilde Poelman (UGent) , Johan Haemers (UGent) , Roland Vanmeirhaeghe (UGent) , Sven Van den Berghe and Christophe Detavernier (UGent)

(2009) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 156(7). p.P122-P126
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- Journal Article
- A1
Modeling the conformality of atomic layer deposition: the effect of sticking probability

Jolien Dendooven (UGent) , Davy Deduytsche (UGent) , Jan Musschoot, Roland Vanmeirhaeghe (UGent) and Christophe Detavernier (UGent)

(2009) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 156(4). p.P63-P67
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- Journal Article
- A1
Atomic layer deposition of titanium nitride from TDMAT precursor

Jan Musschoot, Qi Xie, Davy Deduytsche (UGent) , Sven Van den Berghe, Roland Van Meirhaeghe and Christophe Detavernier (UGent)

(2009) MICROELECTRONIC ENGINEERING. 86(1). p.72-77
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- Conference Paper
- C3
- open access
Conformality of thermal and plasma enhanced ALD

Jolien Dendooven (UGent) , Jan Musschoot, Davy Deduytsche (UGent) , Roland Vanmeirhaeghe (UGent) and Christophe Detavernier (UGent)

(2008) Atomic Layer Deposition, 8th International conference, Abstracts.
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- Conference Paper
- P1
Thermal versus plasma-enhanced ALD : growth kinetics and conformality

Christophe Detavernier (UGent) , Jolien Dendooven (UGent) , Davy Deduytsche (UGent) and Jan Musschoot

(2008) ECS Transactions. In ECS Transactions 16(4). p.239-246
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- Journal Article
- A1
Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N-2 or NH3 plasma

Qi Xie, Jan Musschoot, Christophe Detavernier (UGent) , Davy Deduytsche (UGent) , Roland Van Meirhaeghe, Sven Van den Berghe, Yu-Long Jiang, Guo-Ping Ru, Bing-Zong Li and Xin-Ping Qu

(2008) MICROELECTRONIC ENGINEERING. 85(10). p.2059-2063
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- Journal Article
- A1
Observation of hysteresis in a non-reactive magnetron discharge

Jan Musschoot, Diederik Depla (UGent) , Johan Haemers (UGent) and Roger De Gryse (UGent)

(2008) Plasma Sources Science and Technology. 17(1).
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- Journal Article
- A1
Investigation of the sustaining mechanisms of dc magnetron discharges and consequences for I-V characteristics

Jan Musschoot, Diederik Depla (UGent) , Guy Buyle, Johan Haemers (UGent) and Roger De Gryse (UGent)

(2008) Journal of Phyics D: Applied Physics. 41(1).
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- Journal Article
- A1
Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition

Q XIE, Jan Musschoot, Davy Deduytsche (UGent) , Roland Vanmeirhaeghe (UGent) , Christophe Detavernier (UGent) , S VAN DEN BERGHE, YL JIANG, GP RU, BZ LI and XP QU

(2008) JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 155(9).
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- Journal Article
- A4
A Monte Carlo simulation of the erosion profile of a rotating cylindrical magnetron

Jan Musschoot, Diederik Depla (UGent) , G Buyle, Johan Haemers (UGent) and Roger De Gryse (UGent)

(2006) BELVAC NEWS. 22(3). p.3-12
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- Journal Article
- A1
Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: a Monte Carlo simulation

Jan Musschoot, Diederik Depla (UGent) , G BUYLE, Johan Haemers (UGent) and Roger De Gryse (UGent)

(2006) JOURNAL OF PHYSICS D-APPLIED PHYSICS. 39(18). p.3989-3993

Academic Bibliography

Jan Musschoot

Mik met een relanceplan op vaste kosten en investeringen

Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate

Atomic layer deposition of titanium and vanadium oxide on mesoporous silica and phenol/formaldehyde resins : the effect of the support on the liquid phase epoxidation of cyclohexene

The coordinatively saturated vanadium MIL-47 as a low leaching heterogeneous catalyst in the oxidation of cyclohexene

Advantages and challenges of plasma enhanced atomic layer deposition

TaCN growth with PDMAT and H-2/Ar plasma by plasma enhanced atomic layer deposition

TiO2/HfO2 bi-layer gate stacks grown by atomic layer deposition for germanium-based metal-oxide-semiconductor devices using GeOxNy passivation layer

Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition

Ultrathin GeOxNy interlayer formed by in situ NH3 plasma pretreatment for passivation of germanium metal-oxide-semiconductor devices

Texture of atomic layer deposited ruthenium

Qualitative model of the magnetron discharge

Conformality of Al2O3 and AlN deposited by plasma-enhanced atomic layer deposition

Modeling the conformality of atomic layer deposition: the effect of sticking probability

Ru thin film grown on TaN by plasma enhanced atomic layer deposition

Microencapsulation of Moisture-Sensitive CaS:Eu2+ Particles with Aluminum Oxide

Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide

Modeling the conformality of atomic layer deposition: the effect of sticking probability

Atomic layer deposition of titanium nitride from TDMAT precursor

Conformality of thermal and plasma enhanced ALD

Thermal versus plasma-enhanced ALD : growth kinetics and conformality

Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N-2 or NH3 plasma

Observation of hysteresis in a non-reactive magnetron discharge

Investigation of the sustaining mechanisms of dc magnetron discharges and consequences for I-V characteristics

Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition

A Monte Carlo simulation of the erosion profile of a rotating cylindrical magnetron

Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: a Monte Carlo simulation

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