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- Journal Article
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- open access
On the growth kinetics of Ni(Pt) silicide thin films
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- PhD Thesis
- open access
In situ study of the formation and properties of nickel silicides
(2010) -
In situ study of the formation and properties of Nisilicides.
(2010) -
The influence of Pt redistribution on Ni1-xPtxSi growth properties
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- Journal Article
- A1
- open access
Phase formation and thermal stability of ultrathin nickel-silicides on Si(100)
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In situ study of the formation of silicide phases in amorphous Co-Si mixed layers
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In situ study of the formation of silicide phases in amorphous Ni-Si mixed layers
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Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films
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Pt redistribution during Ni(Pt) silicide formation
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Effect of Pt addition on growth stress and thermal stress of NiSi films
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Epitaxial formation of a metastable hexagonal nickel-silicide
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Stress evolution during Ni-Si compound formation for fully silicided (FUSI) gates
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Fundamentals of intrinsic stress during silicide formation
(2007) Sixth international conference of the Balkan Physical Union. In AIP Conference Proceedings 899. p.453-454