- ORCID iD
- 0000-0002-0155-7826
Show
Sort by
-
Study on reactive sputtering of yttrium oxide: process and thin film properties
-
The effect of negative oxygen ions on the growth of sputter deposited ceria thin films
-
Momentum transfer driven textural changes of CeO2 thin films
-
Influence of the target-substrate distance on the growth of YSZ thin films
-
Using the macroscopic scale to predict the nano-scale behavior of YSZ thin films
-
- Journal Article
- A1
- open access
Influence of oxygen flow and film thickness on the texture and microstructure of sputtered ceria thin films
-
How does redeposition influence reactive sputtering?
-
Yttria-stabilized zirconia thin films as oxygen ion conductor for solid oxide fuel cells
-
A growth model for sputter deposited ceria thin films
-
Linking functional properties of transition metals to growth parameters
-
- Journal Article
- A1
- open access
The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering
-
Influence of particle and energy flux on stress and texture development in magnetron sputtered TiN films
-
Nanostructured thin films for solid oxide fuel cells: crystallographic properties
-
Understanding the growth of doped CeO2
-
A dynamic simulation tool for reactive sputtering
-
- Journal Article
- A1
- open access
The fictional transition of the preferential orientation of yttria-stabilized zirconia thin films
-
- Conference Paper
- C3
- open access
Nanostructured thin films of yttria-stabilized zirconia
-
- Conference Paper
- C3
- open access
Modeling the time dependency of the reactive sputter process
-
- Conference Paper
- C3
- open access
Understanding the growth of doped ceria thin films
-
- Conference Paper
- C3
- open access
Linking functional properties of transition metals to growth parameters
-
Magnetron sputter deposition as visualized by Monte Carlo modeling
-
Thirty years of rotatable magnetrons
-
Influence of target-substrate distance and composition on the preferential orientation of yttria-stabilized zirconia thin films
-
Modeling reactive magnetron sputtering: fixing the parameter set
-
Deposition of thin films by sputtering cold isostatically pressed powder targets: a case study
-
Angle-resolved energy flux measurements of a HIPIMS-powered rotating cylindrical magnetron in reactive and nonreactive atmosphere
-
- Conference Paper
- C3
- open access
In search for the ultimate model parameters of reactive magnetron sputtering
-
- Conference Paper
- C3
- open access
Reactive sputtering in 5D
-
- Conference Paper
- C3
- open access
The energy and particle fluxes during the growth of multifunctional ZrN thin films deposited by reactive magnetron sputtering
-
Smart textiles: an explorative study of the use of magnetron sputter deposition
-
Fundamental aspects of mixed oxide thin film growth
-
Fundamental aspects of home made targets for magnetron sputtering
-
- Miscellaneous
- open access
Depositie van complexe materialen
-
- Conference Paper
- C3
- open access
A two-dimensional view on the preferential orientation of Yttria-Stabilized zirconia thin films
-
- Conference Paper
- C3
- open access
Sputter deposited transition metal nitrides as back electrode for CIGS solar cells
-
Sputter deposited transition metal nitrides as back electrode for CIGS solar cells
-
Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere
-
- Conference Paper
- C3
- open access
Powder mixtures as deposition targets for multicomponent thin films: a case study
-
In search for the limits of rotating cylindrical magnetron sputtering
-
Simulation of an Ar/O2 magnetron discharge in single and dual configurations with a hybrid model
-
Powder mixtures as deposition targets for multicomponent thin films: a case study
-
Analysis of the behaviour of the reactive species in reactive magnetron sputtering of oxides
-
Fixing the parameter set for reactive sputtering modelling
-
Rotating cylindrical magnetron sputtering: simulation of the reactive process
-
Putting a rotatable magnetron to the test with high power impulse magnetron sputtering
-
Experimental determination and simulation of the angular distribution of the metal flux during magnetron sputter deposition
-
High power impulse magnetron sputtering using a rotating cylindrical magnetron
-
Linking reactive sputtering models to experimental reality by determining the real-time parameters
-
Investigation of the O- ion emission during reactive magnetron sputtering
-
Quantification of the incorporation coefficient of a reactive gas on a metallic film during magnetron sputtering : the method and results
-
Linking reactive sputtering models to experimental reality by determining the real-time parameters
-
Modeling the flux of high energy negative ions during reactive magnetron sputtering
-
Influence of Al content on the properties of MgO grown by reactive magnetron sputtering
-
Quantification of the incorporation coefficient of a reactive gas on a metallic film during magnetron sputtering: the method and results
-
Using Mass Spectrometry to gather some insights in the fundamentals if the reactive magnetron sputtering process of Al with O2
-
Magnetron sputter depositie van dunne filmen
-
Method to determine the sticking coefficient of O₂ on deposited Al during reactive magnetron sputtering, using mass spectrometry
-
Studying the reactive magnetron sputtering deposition of oxides, with mass spectrometry
-
Characterization of Mg-Al oxides grown by reactive magnetron sputtering
-
Some more equations describing reactive magnetron sputtering
-
- Conference Paper
- C3
- open access
Diagnostics of an argon/oxygen magnetron plasma and comparison with Monte Carlo simulation
-
- Conference Paper
- C3
- open access
Characterization of MgxAlyOz thin films grown by reactive magnetron sputtering
-
- Book Editor
- open access
Proceedings of ICTF 14 & RSD 2008
Roger De Gryse (UGent) , Diederik Depla (UGent) , Dirk Poelman (UGent) , Stijn Mahieu (UGent) , Wouter Leroy (UGent) and Hilde Poelman (UGent)(2008) -
Using mass spectrometry to gather some insights in the fundamentals of the reactive magnetron sputtering process of Al with O2
-
Noble gas retention in the target during rotating cylindrical magnetron sputtering
-
Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering
-
Depositing aluminium oxide to study reactive magnetron sputtering
-
- Journal Article
- A1
- open access
Thin film solid-state reactions forming carbides as contact materials for carbon-containing semiconductors
-
- PhD Thesis
- open access
A fundamental study of advanced metal/semiconductor contacts
(2006) -
In-situ X-ray diffraction measurements for monitoring carbide and silicide phase formation
-
In-situ X-ray diffraction measurements for monitoring carbide and silicide phase formation
-
- Journal Article
- A1
- open access
Solid-state formation of titanium carbide and molybdenum carbide as contacts for carbon-containing semiconductors
-
The barrier height inhomogeneity in identically prepared Au/n-GaAs Schottky barrier diodes
-
Influence of hydrogen treatment and annealing processes upon the Schottky barrier height of Au/n-GaAs and Ti/n-GaAs diodes