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Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering
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Influence of the Ar/O-2 ratio on the growth and biaxial alignment of yttria stabilized zirconia layers during reactive unbalanced magnetron sputtering
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Mechanism of preferential orientation in sputter deposited titanium nitride and yttria-stabilized zirconia layers
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Biaxially aligned yttria stabilized zirconia and titanium nitride layers deposited by unbalanced magnetron sputtering
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Growth mechanism of biaxially aligned magnesium oxide deposited by unbalanced magnetron sputtering
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A model for the development of biaxial alignment in yttria stabilized zirconia layers, deposited by unbalanced magnetron sputtering
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Influence of the deposition parameters on the biaxial alignment of MgO grown by unbalanced magnetron sputtering
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Biaxially aligned YSZ layers deposited by unbalanced magnetron sputtering: a model
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Unbalanced magnetron sputter deposition of biaxially aligned yttria stabilized zirconia and indium tin oxide thin films
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Influence of deposition parameters on the biaxial alignment of YSZ buffer layers using an unbalanced magnetron.