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Ontwikkeling van hybride elektroluminescentre cellen met door ALD gegroeide dunne-filmlagen
(2003) -
Hybrid electroluminescent devices with atomic layer deposited thin films on a screen printed dielectric
(2002) JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS. 41(9). p.5702-5705 -
Role of hybrid EL roughness on the electrical behavior.
(2002) Proceedings of the 11th International Workshop on Inorganic and Organic Electroluminescence, and 2002 International Conference on the Science and Technology of Emissive Displays and Lighting, Gent, 23-26 September 2002 / K. Neyts, P. De Visschere, D. Poelman (editors), Gent, Academia Press, 2002. - ISBN 90-382-0417-5. p.355-358 -
Thermal annealing of ZnS:Mn TFEL devices fabricated with an organometallic precursor-based ALD process.
(2002) Proceedings of the 11th International Workshop on Inorganic and Organic Electroluminescence, and 2002 International Conference on the Science and Technology of Emissive Displays and Lighting, Gent, 23-26 September 2002 / K. Neyts, P. De Visschere, D. Poelman (editors), Gent, Academia Press, 2002. - ISBN 90-382-0417-5. p.359-362 -
Atomic layer deposition of ZnS thin films based on diethyl zinc and hydrogen sulfide.
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The study of the low-field behavior of optically generated charges in thin-film electroluminescent devices.
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Deposition of luminescent ZnO films by ALCVD.
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Sensitive current, brightness and efficiency measurements in SrS-based thin film electroluminescent devices.
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Hybrid EL devices using screen printing and atomic layer deposition techniques.
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Electrical modeling of interface roughness in thin film electroluminescent devices.