ereprof. dr. Johan Haemers
No current affiliation with UGent
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- Conference Paper
- C3
- open access
Plasma-enhanced ALD on particles and powders
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- Conference Paper
- C3
- open access
Thermal and plasma enhanced atomic layer deposition on powders and particles
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Thermal and plasma-enhanced atomic layer deposition of TiN using TDMAT and NH3 on particles agitated in a rotary reactor
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- Conference Paper
- C3
- open access
Conformal nanocoatings for surface engineering of particles by thermal and plasma-enhanced atomic layer deposition using a rotary reactor
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Influencing the hysteresis during reactive magnetron sputtering by gas separation
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- Conference Paper
- C3
- open access
Thermal and plasma-enhanced ALD of TiN on powders using a rotary reactor
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- Conference Paper
- C1
- open access
A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
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A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
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Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate
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- Conference Paper
- C3
- open access
A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
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Thirty years of rotatable magnetrons
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Rotatable magnetron sputtering: downscaling for better understanding
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Rotating cylindrical magnetron sputtering: simulation of the reactive process
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Texture of atomic layer deposited ruthenium
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Qualitative model of the magnetron discharge
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Influence of the magnetic field configuration on the reactive sputter deposition of TiN
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Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide
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Some more equations describing reactive magnetron sputtering
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Observation of hysteresis in a non-reactive magnetron discharge
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Investigation of the sustaining mechanisms of dc magnetron discharges and consequences for I-V characteristics
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Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering
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Understanding the discharge voltage behavior during reactive sputtering of oxides
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Discharge voltage measurements during magnetron sputtering
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Hysteresis behavior during reactive magnetron sputtering of A(2)O(3) using a rotating cylindrical magnetron
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Discharge voltage measurements during reactive sputtering of oxides
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A Monte Carlo simulation of the erosion profile of a rotating cylindrical magnetron
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Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: a Monte Carlo simulation
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- Conference Paper
- C1
- open access
Characterization of the Electron Movement in Varying Magnetic Fields and the Resulting Anomalous Erosion
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Simplified model for the DC planar magnetron discharge
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Simplified model for the DC planar magnetron discharge
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Implantation of the sputtering gas as a factor in the target voltage behaviour during reactive sputtering
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Instabilities in the reactive sputtering of electrical insulating compounds
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Recapture of secondary electrons by the target in a DC planar magnetron discharge
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Simplified model for calculating the pressure dependence of a direct current planar magnetron discharge
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- Conference Paper
- C1
- open access
Dissection of the Planar Magnetron Discharge
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Arc Discharges in the Reactive Sputtering of Electrical Insulating Compounds.
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Influence of recapture of secondary electrons on the magnetron sputtering deposition process.
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Low pressure Behaviour of the sputter magnetron discharge
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Poisoning during sputtering of an Al-target in a mixture of Ar and O2.
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Reactive DC sputtering of silver in a nitrogen/argon mixture
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Sputtering of an Al-target in a mixture of Ar and O2
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Target surface condition during reactive glow discharge sputtering of copper.
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Target voltage behaviour during DC sputtering of silicon in an argon/nitrogen mixture.
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Importance of recapture of secondary electrons in cylindrical and planar magnetron discharges.
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Chemical instability of the target surface during DC-magnetron sputtering of ITO-coatings.
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Yttria-stabilized zirconia thin films grown by r.f. magnetron sputtering from an oxide target
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Yttria-stabilized zirconia thin films grown by reactive rf magnetron sputtering
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Statistical analysis of a V2O5/TiO2 model catalyst, prepared by magnetron sputtering